Electronic Properties of Post-Hydrogenated Lightly-Boron-Doped CVD Amorphous Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-12-20
著者
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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Kohno Kenji
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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NAKASHITA Toshio
Department of Electrical Engineering, Hiroshima University
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Kohno K
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Nakashita Toshio
Department Of Applied Physics
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IMURA Takeshi
Department of Electrical Engineering, Hiroshima University
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Kohno Kenji
Department of Electrical Engineering, Hiroshima Denki Institute of Technology
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
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