Osaka Yukio | Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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概要
関連著者
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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Osaka Y
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Osaka Y
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Imura T
Mitsubishi Paper Mills Ltd.
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Imura T
Department Of Electrical Engineering Hiroshima University
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Hirose Masataka
Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer
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Kohno Kenji
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Myoren Hiroaki
Department Of Electrical And Electronic Systems Faculty Of Engineering Saitama University
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Nasu Hiroyuki
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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TSUNETOMO Keiji
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Nakashita Toshio
Department Of Electrical Engineering Hiroshima University:(present Address) Department Of Applied Ph
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明連 広昭
東北大通研
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MYOREN Hiroaki
Department of Electrical Engineering, Hiroshima University
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Kohno K
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Ueda M
Univ. Tokushima Tokushima Jpn
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UEDA Masato
Department of Applied Chemistry, Faculty of Engineering, Osaka Institute of Technology
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NASU Hiroyuki
Department of Chemistry for Materials, Faculty of Engineering, Mie University
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Osaka Yukio
Department Of Electrical Engineering Hiroshima University
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Tsunetomo K
Nippon Sheet Glass Co. Ltd. Ibaraki Jpn
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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HIROSE Masataka
Department of Electrical Engineering, Hiroshima University
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Ueda M
Tokyo Inst. Technol. Tokyo Jpn
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Ueda M
The Institute Of Scientific And Industrial Research Osaka University
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CHAYAHARA Akiyoshi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Hirose Minoru
Process Development Division Fujitsu Limited
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SUZUKI TOHRU
Department of Chemical Engineering, Faculty of Engineering, Nagoya University
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Hirose Masataka
Department Of Electrical Engineering Hiroshima University
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Tokumitsu Yoji
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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MISHIMA Yasuyoshi
Department of Electrical Engineering, Hiroshima University
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Okamoto Masaki
Department Of Applied And Bioapplied Chemistry Graduate School Of Engineering Osaka City University
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NAKASHITA Toshio
Department of Electrical Engineering, Hiroshima University
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NISHIBAYASHI Yoshiki
Department of Electrical Engineering, Hiroshima University
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YOKOYAMA Haruki
Department of Electrical Engineering, Hiroshima University
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KITAYAMA Haruyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Matsuo Shinji
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Kurata Hiroyuki
Department of Bioscience and Bioinformatics, Kyushu Institute of Technology
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Kurata Hiroyuki
Department Of Electrical Engineering Hiroshima University
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YAMAMOTO Masaki
Department of Chemistry, Faculty of Science, Okayama University
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HAMASAKI Toshihiko
Department of Electrical Engineering, Hiroshima University
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Hayashi Ryo
Department Of Advanced Prosthodontics Division Of Cervico-gnathostomatology Programs For Applied Bio
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Kurata Hiroyuki
Department Of Bioscience And Bioinformatics Kyushu Institute Of Technology
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NISHIYAMA Yukio
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Nishiyama Yukio
Faculty Of Engineering Hiroshima University
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Nishiyama Yukio
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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IWAOKA Teiji
Department of Electrical Engineering, Hiroshima University
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Iwaoka Teiji
Department Of Electrical Engineering Hiroshima University
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Yokoyama H
Electrotechnical Lab. Ibaraki Jpn
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KURIBAYASHI Hiromitsu
WaferMasters, Inc.
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Nishibayashi Y
Sumitomo Electric Industries Ltd. Hyogo
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TOKUMITSU Yoji
Department of Electrical Engineering, Hiroshima University
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IBARA Yoshikazu
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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MISHIMA Yasuyoshi
Fujitsu Laboratories Ltd.
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Kawabuchi Akira
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Kitayama Haruyuki
Wafermasters Inc.
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Hamasaki T
Okayama Univ. Science Okayama
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Ibara Y
Department Of Electrical Engineering Hiroshima University
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KATO Takeshi
Department of Applied Physics, University of Miyazaki
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HAYASHI Ryo
Department of Chemistry, Faculty of Science and Engineering, Saga University
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Kato Takayoshi
Reseach Institute Of Electronics Shizuoka University
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Hayashi Ryo
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Kato T
Graduate School Of Engineering Nagoya University
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Koshikawa Takanori
Fundamental Electronics Research Institute Academic Frontier Promotion Center Osaka Electro-communic
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Kato T
Ashikaga Inst. Technol. Tochigi
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Kato T
Optoelectronics Technology Research Lab. Ibaraki
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Iwaoka T
Department Of Electrical Engineering Hiroshima University:(present Address) Disco Abrasive Systems L
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Miyamoto N
Spring-8 Service Co. Ltd.
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Kondo T
Graduate School Of Science Nagoya University
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TOYOMURA Fumitaka
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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KATAYAMA Hideyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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MAKIDA Seigo
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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FUKUMOTO Hirofumi
Department of Electrical Engineering, Hiroshima University
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Tokumitsu Y
Department Of Electrical Engineering Hiroshima University
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SAITO Koji
Department of Physics, Tokai University
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山本 雅彦
阪大工
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Yamamoto Masanobu
Sony Corp. Tokyo Jpn
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Okamoto Masaki
Department of Respiratory Medicine, Tenri Hospital
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Yamamoto M
Ntt System Electrics Lab. Kanagawa Jpn
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito K
Department Of Materials Technology Chiba University
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Okamoto M
Osaka Univ. Osaka Jpn
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Okamoto Masaki
Department Of Electrical Engineering Hiroshima University
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SHIMIZU Tatsuo
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University
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MIYAMOTO Naokazu
Department of Radiology and Nuclear Medicine, Hyogo Brain and Heart Center
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MATSUO Shinji
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Sato K
Department Of Electronics And Information Science Teikyo University Of Science And Technology
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Nishiyama Fumitaka
Department Of Electrical Engineering Hiroshima University
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Nishiyama Fumitaka
Department Of Applied Physics And Chemistry Hiroshima University
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Fujisawa Masami
Synchrotron Radiation Laboratory Institute For Solid State Physics The University Of Tokyo
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HARADA Kanji
Department of Electrical Engineering, Tsuyama National College of Technology
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Saito K
Nagaoka National Coll. Technol. Nagaoka Jpn
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Miyamoto Naokazu
Department Of Radiology And Nuclear Medicine Hyogo Brain And Heart Center
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Osaka Yukio
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Kodama Takeshi
Department Of Chemistry Tokyo Metropolitan University
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Okamoto M
Department Of Electrical Engineering Osaka University
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Saito K
Application Laboratory
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Saito K
Av-it Development Group. Sony Corporation
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Miyamoto Hironobu
Department Of Electrical Engineering Hiroshima University
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UTSUMI Yoshiharu
Department of Electrical Engineering, Hiroshima University
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Saito Koji
Department Of Gastroenterology Yamagata University School Of Medicine
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Yamanishi Masamichi
Department Of Electrical Engineering College Of Engineering University Of Osaka Prefecture
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陳 健
南京大学電子科学工学科
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陳 健
東北大通研
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YAMASHITA Tsutomu
Research Institute of Electrical Communication Tohoku University
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弘津 禎彦
大阪大学産業科学研究所
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NAKAJIMA Kensuke
Research Institute of Electrical Communication, Tohoku University
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CHEN Jian
Department of Electronics, Nagaoka University of Technology
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SUZUKI Hajime
Technological Research Center, Riken Co.
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KUROSAWA Hideyuki
Technological Research Center, Riken Co.
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MUTOH Yoshiharu
Department of Mechanical Engineering, Nagaoka University of Technology
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HIROTSU Yoshihiko
Department of Mechanical Engineering, Nagaoka University of Technology
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Yokoyama Shin
Department of Medicine, Division of Cardiovascular Medicine, Nihon University School of Medicine
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NAKASHIMA Toshio
Department of Materials Science, Faculty of Engineering, Tottori University
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Mizuno Hiroyuki
Department of Bacteriology Osaka Dental University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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弘津 禎彦
大阪大学産業科学研究所高次制御材料科学研究部門材料機能物性研究分野
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YAMANAKA SHOJI
Department of Pathology, Yokohama City University
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Mizuno Hiroyuki
Department Of Electrical Engineering Hiroshima Kokusaigakuin University
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Goto Fumiaki
Department Of Biology And Geosciences Graduate School Of Science And Engineering Shizuoka University
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明連 広昭
東北大 電通研
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FUJISAWA Masami
Synchrotron Radiation Laboratory, Institute of Solid Stale Physics, The University of Tokyo
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MIYAMOTO Hironobu
Department of Electrical Engineering, Hiroshima University
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Myoren Hiroaki
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Myoren Hiroaki
Faculty Of Engineering Saitama University
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HATTORI Makoto
Department of Applied Biological Science, Faculty of Agriculture, Tokyo University of Agriculture an
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KOSHIDA Nobuyoshi
Department of Electrical and Electronic Engineering, Faculty of Technology, Tokyo University of Agri
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KODAMA Takeshi
Department of Chemistry, Tokyo Metropolitan University
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KUMEDA Minoru
Department of Electronics, Faculty of Technology, Kanazawa University
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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Takiyama Ken
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Hiraki Akio
Department Of Electrical Engineering Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Yamanaka Shoji
Department Of Applied Chemistry Faculty Of Engineering Hiroshima University
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Koshida Nobuyoshi
Department Of Electrical And Electronic Engineering Faculty Of Technology Tokyo University Of Agricu
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ISHIKAWA Takatoshi
Department of Experimental Pathology, Cancer Institute
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Suzuki H
Solid State Division Hamamatsu Photonics K.k.
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NISHIYAMA Fumitaka
Faculty of Engineering, Hiroshima University
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Suzuki H
Meidensha Corp. Tokyo Jpn
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Mutoh Yoshiharu
Department Of Mechanical Engineering Nagaoka University Of Technology
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OSAKA Y.
Department of Physics, Tohoku University
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Suzuki Hisanori
Solid State Division Hamamatsu Photonics K.k.
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Nakashima Toshio
Department Of Agricultural Biology Faculty Of Agriculture Hokkaido University
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Yamashita Tsutomu
Recearch Institute Of Electrical Communication Tohoku University
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Yamashita Tsutomu
New Industry Creation Hatchery Center Tohoku University
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Matsumoto Takeshi
Department Of Biomechanical Engieering Graduate School Of Engineering Scien
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Nishiyama Fumitaka
Faculty Of Engineering Hiroshima University
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Ishikawa Takatoshi
Department Of Applied Physics Faculty Of Science Fukuoka University
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Ishikawa Takatoshi
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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MIYAMOTO Aiko
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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MIYAMOTO Naokazu
Faculty of Engineering, Hiroshima University
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KAI Yasuaki
Faculty of Engineering, Hiroshima University
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YAMANAKA Yasushi
Faculty of Engineering, Hiroshima University
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OSAKA Yukio
Faculty of Engineering, Hiroshima University
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HAMASAKI Toshihiko
ULSI Research Center, Toshiba Corporation
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Ishida Kouichi
Department of Zoology, Graduate School of Science, Kyoto University
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Osaka Yukio
Department Of Electrical Engineering Hiroshima Kokusaigakuin University
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Osaka Yukio
Department Of Physical Electronics Faculty Of Engineering Hiroshima University
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Miyamoto A
Tohoku Univ. Miyagi Jpn
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Kumeda Minoru
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
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Yamamoto Tomio
Department Of Electrical Engineering Hiroshima University
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Ishida Kouichi
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Kodama T
Hiroshima Univ. Higashihiroshima Jpn
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Kodama T
Hiroshima Univ. Medical School Hiroshima Jpn
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Kodama Takeshi
Department Of Electrical Engineering Hiroshima University
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SHIZUMA Kiyoshi
Department of electrical Engineering, Hiroshima University
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Kohno Kenji
Department Of Electronic And Information Engineering Tokyo University Of Agricuture And Technology
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Yamashita T
Tohoku Univ. Sendai Jpn
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Takahiro K
Tohoku University
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Takahiro Katsumi
Department Of Electrical Engineering Hiroshima University
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Nakashita T
Department Of Applied Physics Faculty Of Engineering Tokai University
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Hirotsu Yoshihiko
Department Of Mechanical Engineering Nagaoka University Of Technology
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Shizuma Kiyoshi
Department Of Electrical Engineering Hiroshima University
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Shizuma Kiyoshi
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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AKAMATSU Chikashi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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YAMASAKI Toshifumi
Department of Electrical Engineering, Hiroshima University
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IMURA Takeshi
Mitsubishi Paper Mills Ltd.
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Kurosawa Hideyuki
Tatsuta Electric Wire & Cable Co.
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OKAMOATO Masaki
Department of Electrical Engineering, Hiroshima University
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Shimizu Ryuichiro
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Kitayama Hayuyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Abe Yutaka
Department Of Biotechnology And Life Science Faculty Of Engineering Tokyo University Of Agriculture
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Kai Yasuaki
Faculty Of Engineering Hiroshima University
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SHRESTHA Purushottam
Department of Electrical Engineering, Hiroshima University
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SUGISHIMA Tatsumi
Department of Electrical Engineering,Hiroshima University
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Hattori Makoto
Department Of Applied Biological Science Tokyo University Of Agriculture And Technology
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Yamashita T
Hirosaki Univ. Hirosaki Jpn
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Shimizu Ryuichiro
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Shrestha Purushottam
Department Of Electrical Engineering Hiroshima University
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Hasegawa Seiichi
Department Of Electronics Faculty Of Technology Kanazawa University
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Hamasaki Toshihiko
Ulsi Research Center Toshiba Corporation
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Yamasaki Toshifumi
Department Of Electrical Engineering Hiroshima University
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Yamanishi Masamichi
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Nagamine Kunihiro
Department Of Electrical Engineering Hiroshima University
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INOUE Katsuto
Department of Electrical Engineering, Hiroshima University
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Inoue Katsuto
Department Of Electrical Engineering Hiroshima University
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Utsumi Y
Hitachi Ltd. Ibaraki Jpn
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Chen Jian
Department Of Biotechnology Southern Taiwan University Of Technology
著作論文
- YBa_2Cu_3O_ Angle Grain Boundary Junction on Si Bicrystal Substrate
- Substitutional Doping of a-Si_xN_ : H : III-1: AMORPHOUS FILMS
- Wide Optical-Gap, Photoconductive a-Si_xN_: H
- Nucleation of Microcrystallites in Phosphorus-Doped Si: H Films
- A New Technique of Boron Doping in Si:H Films
- Effect of Hydrogen Dilution on Structure of a-Si:H Prepared by Substrate Impedance Tuning Technique : Condensed matter
- Microcrystallization in P-Doped Si:H Films at High Deposition Rate
- Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate
- Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate
- Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
- Annealing Effect on Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate by Substrate Impedance Tuning Technique
- Effect of Annealing on Hydrogenated Amorphous Silicon Prepared at High Deposition Rate
- Amorphous Silicon Static Induction Transistor
- Exciton Structure in Alkali-Halide Crystals
- Epitaxial Growth of Ba_2YCu_3O_x Thin Film on Epitaxial ZrO_2/Si(100) : Electrical Properties of Condensed Matter
- Physical Properties of SiO_2-doped Si Films and Electroluminescence in Metal/SiO_2-doped Si/p-Si Diodes
- Preparation of B-Si-Ge Alloys by Sputter-Assisted-Plasma CVD
- Changes of Structural, Electrical, and Optical Properties of Microcrystalline Si_xGe_ Films by Annealing
- Electronic Properties of Post-Hydrogenated Lightly-Boron-Doped CVD Amorphous Silicon
- Growth of Microcrystalline Si_xGe_ Alloy Films by Sputter-Assisted-Plasma CVD
- Nonlinear I-V Characteristics of Bi_2Sr_2CaCu_2O_x Thin Films
- Preparation and Properties of Ultrathin High-T_c Superconducting Films on Si
- Fabrication of All-High-T_c Josephson Junction Using As-Grown YBa_2Cu_3O_x Thin Films
- Crystalline Qualities and Critical Current Densities of As-Grown Ba_2YCu_3O_x Thin Films on Silicon with Buffer Layers
- Josephson Effect in Wide Superconducting Bridges Made by Epitaxial Ba_2YCu_3O_x Thin Films on YSZ/Si(100)
- Two-Phase Structure of a-Si_N_x:H Fabricated by Microwave Glow-Discharge Technique
- Quantum Size Effect and HRTEM Observation of CdSe Microcrystallites Doped into SiO_2-Glass Films Prepared by Rf-Sputtering
- A New Method of Measuring Internal Stress in Thin Films Deposited on Silicon by Raman Spectroscopy
- Raman Scattering Study of Tehrmal SiO_2 Layers Grown on Silicon
- Epitaxial Growth of CdTe by H_2 Sputtering : Semiconductors and Semiconductor Devices
- Deposition of Hydrogenated Microcrystalline Films of CdTe by Chemical Sputtering in Hydrogen : Surfaces, Interfaces and Films
- Epitaxial Growth of CdTe on InSb(100) by RF Sputtering
- Properties of Amorphous Silicon Nitride Prepared at High Deposition Rate
- Reflectance spectra of BN Materials in the Vacuum Ultraviolet
- Photoluminescence of Si Microcrystals Embedded in Si0_2 Glass Films
- Photoluminescence from Si Network in SiO_2-Doped Si Films
- Appearance of Quasi-Direct Optical Transition from Si Network in SiO_2-Doped Si Films
- Visible Photoluminescence from Si Microcrystals Embedded in SiO_2 Glass Films
- Preparation and Properties of Si Microcrystals Embedded in SiO_2 Glass Films
- Preparation and Properties of Ge Microcrystals Embedded in SiO_2 Glass Films
- Structural Changes of Amorphous GeTe_2 Films by Annealing (Formation of Metastable Crystalline GeTe_2 Films)
- Interface States Induced by Amorphous SiO_2 in MOS Structures
- Defect States and Electronic Properties of Post-Hydrogenated CVD Amorphous Silicon
- Preparation of the High-T_c Superconducting Phase in Bi, Pb-Sr-Ca-Cu-O films by Pyrolysis of 2-Ethylhexanoates : Electrical Properties of Condensed Matter
- Formation of High-T_c Superconducting BiSrCaCu_2O_x Films on ZrO_2/Si(100) : Electrical Properties of Condensed Matter
- preparation of BiSrCaCu_2O_x Films with T_c>77 K by Pyrolysis of Organic Acid Salts : Electrical Properties of Condensed Matter
- DSC Studies of Glassy Behavior in P-Doped a-Si:H : Condensed Matter
- Optical and Mechanical Properties of Hard Hydrogenated Amorphous Carbon Films Deposited by Plasma CVD
- Formation of Cubic Boron Nitride Film on Si with Boron Buffer Layers
- Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition
- CuCl Microcrystallite-Doped SiO_2 Glass Thin Films Prepared by RF Sputtering
- Preparation and Properties of In_xGa_As Microcrystallites Embedded in SiO_2 Glass Films
- Evaluation of Epitaxial ZnTe Films Prepared by RF Sputtering by Means of Ion Beam Channeling
- Semiconducting CdTe Microcrystalline-Doped SiO_2 Glass Thin Films Prepared by Rf-Sputtering
- Heteroepitaxial Growth of ZnS_xTe_ on GaAs(100) by RF Sputtering
- Preparation and Crystallization Process of the High-T_c Superconducting Phase (T_c(end)>100 K) in Bi, Pb-Sr-Ca-Cu-O Glass-Ceramics
- Synthesis of Metastable Ge_xSn_ Alloys by Chemical Sputtering in H_2
- Heteroepitaxial Growth of Yttria-Stabilized Zirconia (YSZ) on Silicon : Surfaces, Interfaces and Films
- Characterization of the Structure in Hydrogenated Amorphous Silicon by Means of ^Sn Mossbauer Spectroscopy
- Function of Substrate Bias Potential for Formation of Cubic Boron Nitride Films in Plasma CVD Technique
- Effects of Film Thickness and Substrate-Film Interface on the Formation of Metastable Crystalline GeTe_2 from Amorphous GeTe_2 Film
- Formation of Metal-Insulator-Semiconductor Structure(B/Hexagonal BN/Graphite) by Plasma Chemical Vapor Deposition
- Effects of a Negative Self-Bias on the Growth of Cubic Boron Nitride Prepared by Plasma Chemical Vapor Deposition
- Preparation and Crystallization Process of High-T_c Superconducting Bi, Pb-Sr-Ca-Cu-O Film (T_c=101 K) by Melt-Quenching and Annealing Techniques
- Formation of Cubic Boron Nitride Films on Diamond by Plasma CVD Technique
- Structural Changes of Amorphous Ge_Sn_x Alloy Films by Annealing
- Binding Energy of a Screened Hydrogenic Impurity in a Quasi One-Dimensional Electron Gas
- Binding Energies of Wannier Excitons in Ga_Al_xAs Quantum-Well Wires
- Formation of Polycrystalline SiC in ECR Plasma
- Internal Photoemission in a-Si:H Schottky-Barrier and MOS Structures : III-2: AMORPHOUS SOLAR CELLS : Characterization
- Current Transport Mechanism of Hydrogenated Amorphous Silicon Schottky Barrier Diodes
- Theoretical Interpretation of Capacitance-Voltage Characteristics of Metal-a-Si:H Schottky Barriers
- Exact Determination of Bulk Gap-State Density in a-Si : H : III-1: AMORPHOUS FILMS
- Influence of Gap States on Basic Characteristics of a-Si:H Thin Film Transistors
- Theoretical Interpretations of the Gap State Density Determined from the Field Effect and Capacitance-Voltage Characteristics of Amorphous Semiconductors
- Hydrogen Implantation into CVD Amorphous Silicon : II-1: AMORPHOUS FILM PREPARATION AND CHARACTERIZATION (I)
- Electrical and Optical Properties of Amorphous Germanium
- Structural and Electronic Characterization of Discharge-Produced Boron Nitride
- Localized-State-Density Distribution in Post-Hydrogenated CVD Amorphous Silicon
- Schottky Barrier Solar Cells of Weakly Hydrogenated CVD Amorphous Silicon : III-3: AMORPHOUS SOLAR CELLS : Device Physics
- Gap States and ESR of Boron-Doped CVD Amorphous Silicon
- Electronic Density of States in Chemically Vapor-Deposited Amorphous Silicon
- Localized States in Amorphous and Polycrystallized Si
- Surface States in Tunnelable MOS Structures
- Current Transport in Doped Polycrystalline Silicon
- Note on Localized States in Amorphous Germanium
- Silicon Thin-Film Formation by Direct Photochemical Decomposition of Disilane
- Binding Energies of Wannier Excitons in Ga_Al_xAs Quantum-Well Wires
- Optical Emission Spectroscopy of the SiH_4-NH_3-H_2 Plasma during the Growth of Silicon Nitride
- Electron Spin Resonance in Discharge-Produced Silicon Nitride
- Discrete Shifts of Absorption and Emission Lines by Individual Electron-Hole Pair Excitation in DC-Biased Quantum Box Structures
- Infrared Polarized Reflection Spectra of SrTiO_3 Thin Films on Metal/Si
- Collective Excited States and Dielectric Constant in Insulators
- Note on the Boltzmann Equation for Polarons
- Theory of the Anomalous Magnetoresistance in Amorphous Si and Ge
- Lattice Defects and Crystallization of Amorphous Germanium
- Physical Properties of Heavily B-doped Microcrystalline Si-Ge Alloys and Schottky Barrier of B-Si-Ge/P-Si
- Epitaxial Growth of ZnTe on GaAs(100) by RF Sputtering
- Theory of Relaxation of Frozen Defects in Doped Hydrogenated Amorphous Silicon
- Model Calculation of Interface State in a MOS Structure
- Polaron State at a Finite Temperature
- The Effect of Short-Range Order on Paramagnetic Resonance
- Theory of the Density of States Associated with Adatom in Chemisorption within the Anderson Model
- Hydrogenated Amorphous Silicon Produced by Pyrolysis of Disilane in a Hot Wall Reactor
- Effect of Noise on the dc Josephson Effect
- Note on the Generalized Form of Compressibility Sum Rule
- Imaginary Part of the Dielectric Function of Sintered and Microcrystalline Cubic Boron Nitride
- Differential Scanning Calorimetry Studies of P-Doped a-Si:H
- Quantum Size Effect of Semiconductor Microcrystallites Doped in SiO2-Glass Thin Films Prepared by Rf-Sputtering
- As-Grown Preparation of Superconducting Epitaxial Ba2YCu3Ox Thin Films Sputtered on Epitaxially Grown ZrO2/Si(100)
- Te–K EXAFS Study on the Local Structure of Amorphous TexC1-x Alloys
- Study of the Surface of CdTe Treated in H2 Plasma