A New Technique of Boron Doping in Si:H Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-02-05

著者

• Kurata Hiroyuki

  Department of Bioscience and Bioinformatics, Kyushu Institute of Technology

• Kurata Hiroyuki

  Department Of Electrical Engineering Hiroshima University

• OSAKA Yukio

  Department of Electrical Engineering, Hiroshima University

• HIROSE Masataka

  Department of Electrical Engineering, Hiroshima University

• HAMASAKI Toshihiko

  Department of Electrical Engineering, Hiroshima University

• Hirose Minoru

  Process Development Division Fujitsu Limited

• Kurata Hiroyuki

  Department Of Bioscience And Bioinformatics Kyushu Institute Of Technology

• Osaka Y

  Hiroshima Kokusaigakuin Univ. Hiroshima Jpn

• Osaka Yukio

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Hamasaki T

  Okayama Univ. Science Okayama

• Hirose Masataka

  Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer

• Hirose Masataka

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Hamasaki Toshihiko

  Department Of Electrical Engineering Hiroshima University

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