Diffusion of constituent Atoms in P-type a-Si:H / SnO_2 Interfaces : Surfaces, Interfaces and Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1988-07-20

著者

• Kawabata K

  Division Of Physics Graduate School Of Science Hokkaido University

• HIROSE Masataka

  Department of Electrical Engineering, Hiroshima University

• Hirose Minoru

  Process Development Division Fujitsu Limited

• Miyazaki Seiichi

  Department Of Electrical Engineering Hiroshima University

• Miyazaki Seiichi

  Dept. Of Electrical Engineering Hiroshima University

• KAWABATA Keishi

  Department of Electronics, Hiroshima Institute of technology

• SHIRATSUKI Yoshiyuki

  Department of Electrical Engineering, Hiroshima University

• Miyazaki Seiichi

  Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive

• Kawabata Keishi

  Department Of Electronics Engineering Hiroshima Institute Of Technology

• Kawabata K

  Transdisciplinary Life Science Course Faculty Of Advanced Life Science Hokkaido University

• Shiratsuki Yoshiyuki

  Department Of Electrical Engineering Hiroshima University

• Hirose Masataka

  Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer

• Hirose Masataka

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Kawabata Kazushige

  Division Of Biological Sciences Graduate School Of Science

• Miyazaki Seiichi

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

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