Sub-Half-Micron Silicon Pattern Generation by Electron Beam Direct Writing on Polysilane Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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HIROSE Masataka
Department of Electrical Engineering, Hiroshima University
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Okamoto Kazuya
Central Research Laboratory Nikon Corporation
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Miyazaki Seiichi
Department Of Electrical Engineering Hiroshima University
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Miyazaki Seiichi
Dept. Of Electrical Engineering Hiroshima University
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Hashimoto M
Department Of Macromolecular Science And Engineering Graduate School Of Science And Technology Kyoto
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Hashimoto M
Department Of Polymer Science And Engineering Faculty Of Textile Science Kyoto Institute Of Technolo
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SHIBA Kazutoshi
Department of Electrical Engineering, Hiroshima University
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SHIN Hidetoshi
Department of Electrical Engineering, Hiroshima University
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OKAMOTO Katsuhiko
Department of Electrical Engineering, Hiroshima University
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Miyazaki Seiichi
Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive
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SHIBA Kazutoshi
NEC Electronics Corporation
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Shin Hidetoshi
Department Of Electrical Engineering Hiroshima University
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OKAMOTO Kimiharu
JEOL Limited
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Shiba K
Nec Electronics Corporation
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Shiba Kazutoshi
Ulsi Device Development Division Nec Corporation
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Okamoto K
Jeol Limited
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Hirose Masataka
Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer
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Hirose Masataka
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Miyazaki Seiichi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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