High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
スポンサーリンク
概要
- 論文の詳細を見る
- 1995-08-21
著者
-
Iwata A
Hiroshima Univ. Higashi-hiroshima‐shi Jpn
-
NAGATA Takahiro
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
-
Miyazaki S
Hiroshima Univ. Higashi‐hiroshima Jpn
-
Nagata Tetsuya
Hitachi Research Laboratory Hitachi Ltd.
-
Miyazaki Seiichi
Department Of Electrical Engineering Hiroshima University
-
Miyazaki Seiichi
Dept. Of Electrical Engineering Hiroshima University
-
YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
-
YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
-
Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
-
IWATA Atsushi
A-R-Tec Corporation
-
SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
-
HIROSE Masataka
Faculty of Engineering, Hiroshima University
-
NAMBA Tohru
Research Center for Integrated Systems, Hiroshima University
-
UEHARA Akihito
Research Center for Integrated Systems, Hiroshima University
-
DOI Takeshi
Department of Electrical Engineering, Hiroshima University
-
NAGATA Takahiko
Research Center for Integrated Systems, Hiroshima University
-
KURODA Yasuhide
Research Center for Integrated Systems, Hiroshima University
-
IWATA Atushi
Department of Electrical Engineering, Hiroshima University
-
HIROSE Masataka
Research Center for Integrated Systems, Hiroshima University
-
Nagata Takahiro
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
-
Iwata Atsushi
Electronic Materials And Devices Division Mitsubishi Petrochemical Co. Ltd.
-
Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
-
Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
-
Miyazaki Seiichi
Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive
-
Nagata T
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
-
Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
-
Namba Tohru
Research Center For Integrated Systems Hiroshima University
-
Doi Takeshi
Faculty Of Engineering Hiroshima University
-
Doi T
Department Of Bio- And Geoscience Graduate School Of Science Osaka City University
-
Uehara Akihito
Department Of Applied Chemistry Kogakuin University
-
Hirose Masataka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
-
Hirose Masataka
Research Center For Integrated Systems Hiroshima University
-
Kuroda Yasuhide
Research Center For Integrated Systems Hiroshima University
-
Doi Takeshi
Department Of Bio- And Geoscience Graduate School Of Science Osaka City University
-
Yokoyama S
Kyushu Univ. Fukuoka Jpn
-
Shibahara K
Hiroshima Univ. Higashihiroshima‐shi Jpn
-
Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
-
Doi T
Univ. Tokyo Tokyo Jpn
-
Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
-
Miyazaki Seiichi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
関連論文
- Electro-Optic Effect in Epitaxial ZnO:Mn Thin Films
- Ferroelectricity in Li-Doped ZnO:X Thin Films and their Application in Optical Switching Devices
- In-situ Measurement of Temperature Variation in Si Wafer During Millisecond Rapid Thermal Annealing Induced by Thermal Plasma Jet Irradiation
- Melting and Solidification of Microcrystalline Si Films Induced by Semiconductor Diode Laser Irradiation
- Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor
- Characterization of Interfacial Oxide Layers in Heterostructures of Hafnium Oxides Formed on NH_3-Nitrided Si(100)
- Impact of Rapid Thermal O_2 Anneal on Dielectric Stack Structures of Hafnium Aluminate and Silicon Dioxide Formed on Si(100)
- Image Segmentation/Extraction Using Nonlinear Cellular Networks and Their VLSI Implementation Using Pulse-Modulation Techniques(Special Section on Analog Circuit Techniques and Relate)
- A 1-D CMOS PWM Cellular Neural Network Circuit and Resistive-Fuse Network Operation
- Image Object Extraction Using Resistive-Fuse and Oscillator Networks and a Pulse-Modulation Circuit for Their LSI Implementation
- Radical- and Ion-Induced Reactions on Plasma-Deposited Silicon Surfaces
- Growth Kinetics of Silicon Thin Film Studied by Hydrogen Radical and Ion Irradiation : Beam Induced Physics and Chemistry
- Diffusion Barrier Effect of Ultra-Thin Photo-Nitrided a-Si:H Overlayer on SnO_2/Glass Substrate
- Impurity Diffusion Barrier Effect of Ultra-Thin Plasma-Nitrided a-Si:H Overlayer on SnO_2/Glass Substrate
- Electronic Structure of Photochemically Etched Silicon Surfaces : Surfaces, Interfaces and Films
- Enhanced Production of Fattiviracins by Bacitracin-resistant Strains of Streptomyces microflavus Strain No. 2445
- Quantitative Analysis of Oxide Voltage and Field Dependence of Time-Dependent Dielectric Soft Breakdown and Hard Breakdown in Ultrathin Gate Oxides
- Memory Operation of Silicon Quantum-Dot Floating-GateMetal-Oxide-Semiconductor Field-Effect Transistors : Semiconductors
- Analysis of Tunnel Current through Ultrathin Gate Oxides
- Luminescence Study of Thermally-Oxidized Porous Si under Subgap or Overgap Excitation
- Gap-State Distributions in Hydrogenated Amorphous Silicon-Germanium Evaluated Using Capacitance-Voltage Method
- High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
- Electron Tunneling through Ultrathin Gate Oxide Formed on Hydrogen-Terminated Si(100) Surfaces
- Atomic Scale Flatness of Chemically Cleaned Silicon Surfaces Studied by Infrared Attenuated-Total-Reflection Spectroscopy
- BF^+_2 Ion Implantation into Very-Low-Temperature Si Wafer
- Chemical Stability of HF-Treated Si(111) Surfaces
- The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces
- Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
- In-Depth Profiling of Suboxide Compositions in the SiO_2/Si Interface by Angle-Resolved X-Ray Photoelectron Spectroscopy
- AC Field-Stabilization Phenomena of Ferroelectric Liquid Crystals : Condensed Matter
- Physical Properties of Ferroelectric Liquid Crystals and AC Field-Stabilization Effect : Condensed Matter
- Influences of Alignment Materials and LC layer Thickness on AC Field-Stabilization Phenomena of Ferroelectric Liquid Crystals : Condensed Matter
- Modeling of Soft Breakdown in Ultrathin Gate Oxides
- Analytical Modelling of Quasi-Breakdown of Ultrathin Gate Oxides under Constant Current Stressing
- Structural Inhomogeneity in Hydrogenated Amorphous Silicon in Relation to Photoelectric Properties and Defect Density
- Deposition of Hydrogenated Amorphous Silicon under Intermittent Substrate Bias
- In Situ Monitoring of Silicon Surfaces During Reactive Ion Etching
- Correlation between Light-Induced Degradation and Structural Inhomogeneities in Hydrogenated Amorphous Silicon Prepared under High-Rate Deposition Conditions
- Calculation of Subband States in a Metal-Oxide-Semiconductor Inversion Layer with a Realistic Potential Profile
- Analytical Modeling of Metal Oxide Semiconductor Inversion-Layer Capacitance
- Quasibound States of Electric Field-Induced Quantum Wells in Silicon Subsurface
- An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Optically Interconnected Kohonen Net for Pattern Recognition
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
- Resonant Tunneling through SiO_2/Si Quantum Dot/SiO_2 Double Barrier Structures
- Fine SiO_2 Pattern Generation by Electron Beam Direct Writing onto Polysiloxene-Based Thin Films and Its Application to Etch Mask
- Pulse Modulation Techniques for Nonlinear Dynamical Systems and a CMOS Chaos Circuit with Arbitrary 1-D Maps(New System Paradigms for Integrated Electronics)
- An Hadamard Transform Chip Using the PWM Circuit Technique and Its Application to Image Processing(Special Issue on High-Performance Analog Integrated Circuits)
- A CMOS Stochastic Associative Processor Using PWM Chaotic Signals(Special Issue on Integrated Systems with New Concepts)
- Bio-Inspired VLSIs Based on Analog/Digital Merged Technologies
- Merged Analog-Digital Circuits Using Pulse Modulation for Intellingent SoC Applications (Special Section on Analog Circuit Techniques Supporting the System LSI Era)
- A High-Resolution Hadamard Transform Circuit Using Pulse Width Modulation Technique
- A Multi-Quantum-Dot Associative Circuit Using Thermal-Noise Assisted Tunneling
- A Nonlinear Oscillator Network for Gray-Level Image Segmentation and PWM / PPM Circuits for Its VLSI Implementation(Special Section on Intelligent Signal and Image Processing)
- New Non-Volatile Analog Memory Circuits Using PWM Methods (Special Issue on Integrated Electronics and New System Paradigms)
- A Stochastic Association Circuit Using PWM Chaotic Signals
- A Pattern Matching Processor Using Analog-Digital Merged Architecture Based on Pulse Width Modulation
- An Analog-Digital Merged Neural Circuit Using Pulse Width Modulation Technique (Special Section on Analog Circuit Techniques and Related Topics)
- A Stochastic Associative Memory Using Single-Electron Devices and Its Application in Digit Pattern Association
- Guiding Principle of Energy Level Controllability of Silicon Dangling Bond in HfSiON
- Evaluation of Dielectric Reliability of Ultrathin HfSiO_xN_y in Metal Gate Capacitors(Session 9A Silicon Devices VI,AWAD2006)
- Evaluation of Dielectric Reliability of Ultrathin HfSiO_xN_y in Metal Gate Capacitors(Session 9A Silicon Devices VI)
- Evaluation of Dielectric Reliability of Ultrathin HfSiO_xN_y in Metal Gate Capacitors
- Evaluation of Dielectric Reliability of Ultrathin HfSiO_xN_y in Metal Gate Capacitors
- Analysis and Design of Low Loss and Low Mode-Shift Integrated Optical Waveguides Using Finite-Difference Time-Domain Method
- Low-Voltage, Low-Phase-Noise Ring-VCO using 1/f-Noise Reduction Techniques
- A 0.6V Supply CMOS Amplifier Using Noise Reduction Technique of Autozeroing and Chopper Stabilization
- A 1V Low-Noise CMOS Amplifier Using Autozeroing and Chopper Stabilization Technique(Analog Circuit and Device Technologies)
- Design of a Wireless Neural-Sensing LSI(Analog Circuit and Device Technologies)
- A Design of Neural Signal Sensing LSI with Multi-Input-Channels(Analog Circuit Techniques and Related Topics)
- A Neural Recording Amplifier with Low-Frequency Noise Suppression
- A 2.0Vpp Input, 0.5V Supply Delta Amplifier with A-to-D Conversion
- A Low Noise Amplifier Using Chopper Stabilization for a Neural Sensor LSI
- Chip-Level Substrate Coupling Analysis with Reference Structures for Verification(Physical Design,VLSI Design and CAD Algorithms)
- Evaluation of Isolation Structures against High-Frequency Substrate Coupling in Analog/Mixed-Signal Integrated Circuits(Analog Circuit Techniques and Related Topics)
- Electrical Detection of Silicon Binding Protein-Protein A Using a p-MOSFET Sensor
- Electrical Detection of Silicon Binding Protein-Protein A Using a p-MOSFET Sensor
- Electrical detection of Si-tagged Proteins on HF-last Si(100) and Thermally grown SiO_2 surfaces(Session5B: Emerging Devices III)
- Electrical detection of Si-tagged Proteins on HF-last Si(100) and Thermally grown SiO_2 surfaces(Session5B: Emerging Devices III)
- Characterization of Multistep Electron Charging and Discharging of Silicon-Quantum-Dots Floating Gate by Applying Pulsed Gate Biases
- Self-Assembling Formation of Ni Nanodots on SiO_2 Induced by Remote H_2-plasma Treatment and Their Electrical Charging Characteristics
- Electroluminescence from Multiple-Stacked Structures of Impurity Doped Si Quantum Dots
- Evaluation of Chemical Structures and Work Function of NiSi near the Interface between Nickel Silicide and SiO_2
- Characterization of MultiStep Electron Charging to Silicon-Quantum-Dot Floating Gate by Applying Pulsed Gate Biases
- Photo-Induced Electron Charging to Silicon-Quantum-Dot Floating Gate in Metal-Oxide-Semiconductor Memories
- Charge Injection Characteristics of a Si Quantum Dot Floationg Gate in MOS Structures
- Memory Operation and Electron Charging Characteristics of Silicon Quantum-Dot Floating-Gate MOSFETs
- Memory Operation and Electron Charging Characteristics of Silicon Quantum-Dot Floating-Gate MOSFETs
- Etch Damage of n^+ Poly-Si Gate Side Wall as Evaluated by Gate Tunnel Leakage Current
- Transient Characteristics of Electron Charging in Si-Quantum-Dot Floating Gate MOS Memories
- Low-Voltage and Low-Noise CMOS Analog Circuits Using Scaled Devices(Analog Circuits and Related SoC Integration Technologies)
- Single Electron Charging to a Si Quantum Dot Floating Gate in MOS Structures
- Quantum Confinement Effect in Self-Assembled, Nanometer Silicon Dots
- Electron Charging to Silicon Quantum Dots as a Floating Gate in MOS Capacitors