Hirose Masataka | Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

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概要

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著作論文

High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
Electron Tunneling through Ultrathin Gate Oxide Formed on Hydrogen-Terminated Si(100) Surfaces
Atomic Scale Flatness of Chemically Cleaned Silicon Surfaces Studied by Infrared Attenuated-Total-Reflection Spectroscopy
BF^+_2 Ion Implantation into Very-Low-Temperature Si Wafer
Chemical Stability of HF-Treated Si(111) Surfaces
The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces
Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
In-Depth Profiling of Suboxide Compositions in the SiO_2/Si Interface by Angle-Resolved X-Ray Photoelectron Spectroscopy
Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
Optically Interconnected Kohonen Net for Pattern Recognition
High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
Analysis and Design of Low Loss and Low Mode-Shift Integrated Optical Waveguides Using Finite-Difference Time-Domain Method
Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method (Special Issue on Scientific ULSI Manufacturing Technology)

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