EGUSA Kazuhiko | Research Center for Nanodevices and Systems, Hiroshima University
スポンサーリンク
概要
関連著者
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SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
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EGUSA Kazuhiko
Research Center for Nanodevices and Systems, Hiroshima University
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Egusa Kazuhiko
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara K
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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FURUMOTO Hiroaki
Research Center for Nanodevices and Systems, Hiroshima University
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Furumoto Hiroaki
Research Center For Nanodevices And Systems Hiroshima University
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Kamesaki Koji
Research Center For Nanodevices And Systems Hiroshima University
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HIROSE Masataka
Department of Electrical Engineering, Hiroshima University
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Hirose Minoru
Process Development Division Fujitsu Limited
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YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
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HIROSE Masataka
Research Center for Integrated Systems, Hiroshima University
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KOH Meishoku
Research Center for Nanodevices and Systems, Hiroshima University
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SHIRAKATA Toru
Research Center for Nanodevices and Systems, Hiroshima University
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SEO Eisuke
Research Center for Nanodevices and Systems, Hiroshima University
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Seo Eisuke
Research Center For Nanodevices And Systems Hiroshima University
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Shirakata Toru
Research Center For Nanodevices And Systems Hiroshima University
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
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Koh Meishoku
Research Center For Nanodevices And Systems Hiroshima University:crest Japan Science And Technology
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Hirose Masataka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Hirose M
Materials Research Center Tdk Corporation
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Hirose Masataka
Research Center For Integrated Systems Hiroshima University
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Yokoyama S
Kyushu Univ. Fukuoka Jpn
著作論文
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- Improvement in Antimony-Doped Ultrashallow Junction Sheet Resistance by Dopant Pileup Reduction at the SiO_2/Si Interface
- Improvement in Sheet Resistance of Sb-Doped Ultra Shallow Junction by Dopant Pileup Reduction at the SiO_2/Si Interface