Shibahara K | Hiroshima Univ. Higashihiroshima‐shi Jpn
スポンサーリンク
概要
関連著者
-
Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
-
Shibahara K
Hiroshima Univ. Higashihiroshima‐shi Jpn
-
SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
-
Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
-
Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
-
YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
-
Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
-
NISHINO Shigehiro
Department of Electronics and Information Science, Kyoto Institute of Technology
-
MATSUNAMI Hiroyuki
Department of Electronic Science & Engineering, Kyoto University
-
YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
-
Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
-
EGUSA Kazuhiko
Research Center for Nanodevices and Systems, Hiroshima University
-
Egusa Kazuhiko
Research Center For Nanodevices And Systems Hiroshima University
-
Nishino Shigehiro
Department Of Electrical Engineering Technical College Kyoto Institute Of Technology
-
Nishino Shigehiro
Department Of Electrical Engineering Kyoto University
-
Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
-
Nishino S
Kyoto Inst. Technol. Kyoto Jpn
-
Hirose Masataka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
-
Matsunami Hiroyuki
Department Of Electrical Engineering Kyoto University
-
SHIBAHARA Kentaro
Department of Electrical Engineering, Kyoto University
-
Yokoyama S
Kyushu Univ. Fukuoka Jpn
-
Matsunami Hiroyuki
Department Of Eectrical Engineering Kyoto University
-
HIROSE Masataka
Department of Electrical Engineering, Hiroshima University
-
Yokoyama S
Hiroshima Univ. Higashi‐hiroshima Jpn
-
Yokoyama S
Communication Res. Lab. Kobe Jpn
-
Hirose Minoru
Process Development Division Fujitsu Limited
-
Miyazaki S
Hiroshima Univ. Higashi‐hiroshima Jpn
-
Miyazaki Seiichi
Dept. Of Electrical Engineering Hiroshima University
-
HIROSE Masataka
Faculty of Engineering, Hiroshima University
-
HIROSE Masataka
Research Center for Integrated Systems, Hiroshima University
-
FURUMOTO Hiroaki
Research Center for Nanodevices and Systems, Hiroshima University
-
SHIBAHARA Kentaro
the Research Center for Nanodevices and Systems, Hiroshima University
-
Furumoto Hiroaki
Research Center For Nanodevices And Systems Hiroshima University
-
Tsuno M
The Research Center For Nanodevices And Systems Hiroshima University
-
Kamesaki Koji
Research Center For Nanodevices And Systems Hiroshima University
-
Aoki Y
The Reserch Center For Nanodevices And Systems Hiroshima University
-
Hirose M
Materials Research Center Tdk Corporation
-
Hirose Masataka
Research Center For Integrated Systems Hiroshima University
-
Kawakami Nobuyuki
The Electronics Research Laboratory Kobe Steel Corporation
-
Miyazaki Seiichi
Graduate School of Advanced Sciences of Matter, Hiroshima University
-
Iwata A
Hiroshima Univ. Higashi-hiroshima‐shi Jpn
-
Matsunami H
Kyoto Univ. Kyoto Jpn
-
NAGATA Takahiro
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
-
Nagata Tetsuya
Hitachi Research Laboratory Hitachi Ltd.
-
Miyazaki Seiichi
Department Of Electrical Engineering Hiroshima University
-
Kuroda Naotaka
Department Of Electrical Engineering Kyoto University
-
KAWAKAMI Nobuyuki
Electronics Research Laboratory, Kobe Steel, Ltd.
-
IWATA Atsushi
A-R-Tec Corporation
-
MAEDA Jun-ichi
Research Center for Nanodevices and Systems, Hiroshima University
-
SASAKI Yasushi
Research Center for Nanodevices and Systems, Hiroshima University
-
DIETZ Nikolaus
Research Center for Nanodevices and Systems, Hiroshima University
-
MIYAZAKI Seiichi
Faculty of Engineering, Hiroshima University
-
NAMBA Tohru
Research Center for Integrated Systems, Hiroshima University
-
UEHARA Akihito
Research Center for Integrated Systems, Hiroshima University
-
DOI Takeshi
Department of Electrical Engineering, Hiroshima University
-
NAGATA Takahiko
Research Center for Integrated Systems, Hiroshima University
-
KURODA Yasuhide
Research Center for Integrated Systems, Hiroshima University
-
IWATA Atushi
Department of Electrical Engineering, Hiroshima University
-
Dietz Nikolaus
Research Center For Nanodevices And Systems Hiroshima University:department Of Physics North Carolin
-
Maeda Jun-ichi
Research Center For Nanodevices And Systems Hiroshima University
-
KOH Meishoku
Research Center for Nanodevices and Systems, Hiroshima University
-
SHIRAKATA Toru
Research Center for Nanodevices and Systems, Hiroshima University
-
SEO Eisuke
Research Center for Nanodevices and Systems, Hiroshima University
-
TSUNO Morikazu
Research Center for Integrated Systems, Hiroshima University
-
Miyazaki Seiichi
Faculty Of Engineering Hiroshima University
-
Seo Eisuke
Research Center For Nanodevices And Systems Hiroshima University
-
Shirakata Toru
Research Center For Nanodevices And Systems Hiroshima University
-
TSUNO Morikazu
the Research Center for Nanodevices and Systems, Hiroshima University
-
YOKOYAMA Shin
the Research Center for Nanodevices and Systems, Hiroshima University
-
Nagata Takahiro
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
-
Iwata Atsushi
Electronic Materials And Devices Division Mitsubishi Petrochemical Co. Ltd.
-
Miyazaki Seiichi
Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive
-
Nagata T
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
-
Miyazaki S
Department Of Electrical Engineering Hiroshima University
-
Namba Tohru
Research Center For Integrated Systems Hiroshima University
-
Doi Takeshi
Faculty Of Engineering Hiroshima University
-
Doi T
Department Of Bio- And Geoscience Graduate School Of Science Osaka City University
-
Koh Meishoku
Research Center For Nanodevices And Systems Hiroshima University:crest Japan Science And Technology
-
Tsuno Morikazu
Research Center For Integrated Systems Hiroshima University
-
Uehara Akihito
Department Of Applied Chemistry Kogakuin University
-
NOTSU Daisuke
The Reserch Center for Nanodevices and Systems, Hiroshima University
-
IKECHI Naoya
The Reserch Center for Nanodevices and Systems, Hiroshima University
-
AOKI Yasuyuki
The Reserch Center for Nanodevices and Systems, Hiroshima University
-
KAWAKAMI Nobuyuki
The Electronics Research Laboratory, Kobe Steel Corporation
-
AOKI Yasuyuki
Research Center for Nanodevices and Systems, Hiroshima University
-
KUGIMIYA Toshihiro
Electronics and Information Technology Laboratory, Kobe Steel Ltd.
-
Ikechi Naoya
The Reserch Center For Nanodevices And Systems Hiroshima University
-
Notsu Daisuke
The Reserch Center For Nanodevices And Systems Hiroshima University
-
Kugimiya Toshihiro
Electronics And Information Technology Laboratory Kobe Steel Ltd.
-
Miyazaki S
Graduate School Of Advanced Sciences Of Matter Hiroshima University
-
Kuroda Yasuhide
Research Center For Integrated Systems Hiroshima University
-
Doi Takeshi
Department Of Bio- And Geoscience Graduate School Of Science Osaka City University
-
Kawakami Nobuyuki
Electronics Research Laboratory Kobe Steel Ltd.
-
Dohmae Shinichi
Department of Electrical Engineering, Kyoto University
-
Hirose Masataka
Faculty Of Engineering Hiroshima University
-
Doi T
Univ. Tokyo Tokyo Jpn
-
Dohmae S
Kyoto Univ.
-
Sasaki Yasushi
Research Center For Nanodevices And Systems Hiroshima University
-
Miyazaki Seiichi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
著作論文
- High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- A Study of Electrical Characteristics Improvements in Sub-0.1 μm Gate Length MOSFETs by Low Temperature Operation
- New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
- Fabrication of 100 nm Width Fine Active-Region Using LOCOS Isolation(Special Issue on Advanced Sub-0.1μm CMOS Devices)
- Improvement in Antimony-Doped Ultrashallow Junction Sheet Resistance by Dopant Pileup Reduction at the SiO_2/Si Interface
- Improvement in Sheet Resistance of Sb-Doped Ultra Shallow Junction by Dopant Pileup Reduction at the SiO_2/Si Interface
- Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process
- Fabrication of P-N Junction Diodes Using Homoepitaxially Grown 6H-SiC at Low Temperature by Chemical Vapor Deposition
- Plasma Etching of CVD Grown Cubic SiC Single Crystals
- Metal-Oxide-Semiconductor Characteristics of Chemical Vapor Deposited Cubic-SiC