YOKOYAMA Seiji | School of Material Science, Japan Advanced Institute of Science and Technology

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著作論文

Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
New RAM-bus Memory System with Interchip Optical Interconnection
Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
Medium-Energy Ion Spectroscopy Using Ion Implanter
Thickness Dependence of Material Properties of Epitaxial Pb(Zr_xTi_)O_3 Films on Ir/(100) (ZrO_2)_(Y_2O_3)_x(100)Si Structures
Calculation of Electrical Properties of Novel Double-Barrier Metal Oxide Semiconductor Transistors
Effects of Hydrogen and Bias on Single-Crystal Al Growth on Vicinal Si by DC Magnetron Sputtering
Coupled Monte Carlo-Energy Relaxation Analysis of Hot Carrier Light Emission in Metal Oxide Semiconductor Field Effect Transistor's
Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Superconducting Films by Molecular Beam Epitaxy
Atomic Layer Growth of Bi-Sr-Ca-Cu-O by Molecular Beam Epitaxy Using Ozone under UV Irradiation
Influence of Sputtering Geometry on Crystallinity of Al(110) Thin Films on Offset (100)Si

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