Ishibashi T | Ulsi Development Center Mitsubishi Electric Co. Ltd.
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概要
関連著者
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Ishibashi T
Ulsi Development Center Mitsubishi Electric Co. Ltd.
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Ishibashi Takayuki
Institute Of Materials Science University Of Tsukuba
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ISHIBASHI Takayuki
Faculty of Technology, Tokyo University of Agriculture and Technology
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Kawabe Mitsuo
Institute Of Materials Science University Of Tsukuba
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Kawabe Mitsuo
Institute Of Applied Physics University Of Tsukuba
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ISHIBASHI Takayuki
Institute of Materials Science, University of Tsukuba
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Kawabe M
Nikko Materials Co. Ltd. Saitama Jpn
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OKADA Yoshitaka
Institute of Applied Physics. University of Tsukuba
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Okada Yoshitaka
Institute Of Applied Physics University Of Tsukuba
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Kawabe M
Institute Of Applied Physics University Of Tsukuba
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Ishibashi T
Ntt Photonics Laboratories
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Okada Y
Sumitomo Heavy Ind. Ltd. Tokyo Jpn
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Okada Y
Institute Of Applied Physics. University Of Tsukuba
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Mori Kazuo
The Institute Of Physical And Chemical Research
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SATO Katsuaki
Faculty of Technology, Tokyo University of Agriculture and Technology
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SATO Kuninori
National Institute for Fusion Science
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ISHIBASHI Tadao
NTT System Electronics Laboratories
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ISHIBASHI Tadao
NTT LSI Laboratories
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Sato K
Asahi Glass Co. Ltd. Yokohama Jpn
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Mori K
Display Device Research And Development Department Nippondenso Co. Ltd.
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Mori K
Matsushita Technoresearch Inc.
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Mori K
Saga Univ. Saga Jpn
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Sato K
Faculty Of Applied Biological Science Hiroshima University
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Sato K
National Institute For Fusion Science
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Mori Koichi
Department Of Radiological Sciences Ibaraki Prefectural University Of Health Sciences
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YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
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KAWAHARA Toshio
Department of Materials Science and Engineering, National Defense Academy
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Yasuda Naoki
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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Yasuda Naoki
Advanced Tech. R/d Center Mitsubishi Electric Co. Ltd.
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ISHIBASHI Takeo
ULSI Development center, Mitsubishi Electric Co., Ltd.
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TOYOSHIMA Toshiyuki
Advanced Tech, RD Center, Mitsubishi Electric Co., Ltd.
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KANDA Takashi
BU Electronic Materials Clariant (Japan) K. K.
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TANAKA Hatsuyuki
BU Electronic Materials Clariant (Japan) K. K.
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Yamabayashi Yosiaki
NTT Optical Network Systems Laboratories
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YAMABAYASHI Yoshiaki
NTT Optical Network Systems Laboratories
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Sato Katsuaki
Faculty Of Technology Tokyo University Of Agriculture & Techonology
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KAWAHARA Toshihiro
Faculty of Technology, Tokyo University of Agriculture and Technology
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Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
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Sato Kuninori
Institute For Fusion Science
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Yamabayashi Y
Ntt Optical Network Systems Lab. Yokosuka Jpn
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Yamabayashi Yoshiaki
Ntt Optical Network Systems Labaratories
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Sato K
National Defense Acad. Yokosuka Jpn
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Sato K
Faculty Of Technology Tokyo Universily Of Agriculture And Technology
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Sasaki K
Nagoya Univ. Nagoya Jpn
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Shimizu Naoji
Department Of Electrical Engineering Hiroshima University
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KURISHIMA Kenji
NTT LSI Laboratories
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Kobayashi Takashi
NTT LSI Laboratories
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SHIMIZU Naofumi
NTT Optical Network Systems Laboratories
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Ishibashi Takayuki
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Sato K
Dept. Of Energy Engineering And Science Nagoya University
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Tanaka H
Bu Electronic Materials Cariant (japan) K.k.
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Shimizu N
Department Of Electrical Engineering Hiroshima University
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Mori K
Department Of Radiological Sciences Ibaraki Prefectural University Of Health Sciences
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Song Kang-ho
Institute Of Materials Science University Of Tsukuba
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Kanda T
Bu Electronic Materials Cariant (japan) K.k.
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SATO Kazuo
Faculty of Education, Tokusima University
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MORI Kunihiko
NTT Optical Network Systems Laboratories
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Kawahara T
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Makimoto T
Ntt Corp. Atsugi Jpn
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Yokoyama S
Kyushu Univ. Fukuoka Jpn
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MAKIMOTO Toshiki
NTT Basic Research Laboratories, NTT Corporation
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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KATAYAMA Keiichi
Ryoden Semiconductor System Engineering Corporation, Mitsubishi Electric Co., Ltd.
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TANAKA Mikihiko
Ryoden Semiconductor System Engineering Corporation, Mitsubishi Electric Co., Ltd.
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KINOSHITA Yoshiaki
BU Electronic Materials Cariant (Japan) K.K.
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WARASE Natsuo
AZ Electronic Materials, Clariant Corporation
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EAKIN Eon
AZ Electronic Materials, Clariant Corporation
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KANEKO Hisato
Faculty of Technology, Tokyo University of Agriculture and Technology
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LEE Kiejin
Department. of Applied Physics, Tokyo Institute of Technology
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IGUCHI Ienari
Department. of Applied Physics, Tokyo Institute of Technology
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Fujita T
Univ. Tsukuba Ibaraki
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Yoda O
Japan Atomic Energy Res. Inst. Kizu Jpn
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Yoda Osamu
Takasaki Radiation Chemistry Research Establishment Japan Atomic Energy Research Institute
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FUJITA Tomoya
Institute of Materials Science, University of Tsukuba
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Lee Kiejin
Department Of Applied Physics Tokyo Institute Of Technology
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Lee Kiejin
Department. Of Applied Physics Tokyo Institute Of Technology
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Iguchi Ienari
Department Of Physics And Crest-jst Tokyo Institute Of Technology
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Iguchi Ienari
Department Of Applied Physics Tokyo Institute Of Technology:crest Japan Science And Technology Corpo
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Iguchi Ienari
Department. Of Applied Physics Tokyo Institute Of Technology
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Iguchi Ienari
The Department Of Applied Physics Tokyo Institute Of Technology
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Iguchi Ienari
Department Of Applied Physics Tokyo Institute Of Technology
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Kaneko H
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Toyoshima Toshiyuki
Advanced Tech. R/d Center Mitsubishi Electric Co. Ltd.
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ISHIBASHI Teruo
Department of Applied Physics, Hokkaido University
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Makimoto Toshiki
NTT LSI Laboratories
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Yokoyama Shin
Institute of Materials Science, University of Tsukuba
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Yamagami Masaaki
Institute of Materials Science, University of Tsukuba
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Tanaka Mikihiko
Ryoden Semiconductor System Engineering Corporation Mitsubishi Electric Co. Ltd.
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Ishibashi Teruo
Department Of Applied Physics Hokkaido University
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Kaneko Hisato
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Yamagami Masaaki
Institute Of Materials Science University Of Tsukuba
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Makimoto Toshiki
Ntt Basic Laboratories Ntt Corporation
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Katayama Keiichi
Ryoden Semiconductor System Engineering Corporation Mitsubishi Electric Co. Ltd.
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Ishibashi Takeo
Ulsi Development Center Mitsubishi Electric Co. Ltd.
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Yokoyama Shin
Institute Of Materials Science University Of Tsukuba
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OKADA Yoshitaka
Institute of Materials Science, University of Tsukuba
著作論文
- Advanced Micro-Lithography Process for i-line Lithography : Instrumentation, Measurement, and Fabrication Technology
- Advanced Micro-Lithography Process with Chemical Shrink Technology
- Submicron-Size Fabrication of Bi_2Sr_2CaCu_2O_x Thin Films by Utilizing Facet Growth
- Anisotropic Transport Properties in Twin-Free Bi_2Sr_2CaCu_2O_x Thin Films on Tilted LaAlO_3 (001) Substrates
- Quantum Efficiency of InP/InGaAs Uni-Traveling-Carrier Photodiodes at 1.55-1.7 μm Measured Using Supercontinuum Generation in Optical Fiber
- Quantum Efficiency of InP/InGaAs Uni-Traveling-Carrier Photodiodes at 1.55-1.7um Measured Using Supercontinuum Generation in Optical Fiber
- Surface Diffusion of Bi_2Sr_2CuO_ Thin Films Grown by Molecular Beam Epitaxy
- Effects of Electron Irradiation on the Local Structural Change in Oriented Bi_2Sr_2CaCu_2O_x Superconductors
- Bi_2Sr_2CuO_x Thin Films with (011) Vicinal Surfaces Fabricated on Vicinal LaSrGaO_4(110) by Molecular Beam Epitaxy
- Two-Dimensional Epitaxial Growth of Bi_2Sr_2CuO_x on Tilted SrTiO_3(001) Substrates Studied by Reflection High Energy Electron Diffraction
- Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Superconducting Films by Molecular Beam Epitaxy
- InP/InGaAs Double Heterojunction Bipolar Transistors Grown on Si
- InP/InGaAs Heterostructure Bipolar Transistors Grown at Low Temperature by Metalorganic Chemical Vapor Deposition
- Atomic Layer Growth of Bi-Sr-Ca-Cu-O by Molecular Beam Epitaxy Using Ozone under UV Irradiation