Horita Susumu | School Of Materials Science Japan Advanced Institute Of Science And Technology
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関連著者
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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堀井 將
北陸先端科学技術大学院大学 材料科学研究科
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Horii Sadayoshi
School Of Material Science Japan Advanced Institute Of Science And Technology
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KUNIYA Takuji
School of Materials Science, Japan Advanced Institute of Science and Technology
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HORII Sadayoshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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Khoa Tran
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Kuniya Takuji
School Of Material Science Japan Advanced Institute Of Science And Technology
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AKIYAMA Kensuke
Kanagawa Industrial Technology Research Institute
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Toda Takeo
School Of Material Science Japan Advanced Institute Of Science And Technology
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Umemoto Shinya
School Of Materials Science Japan Advanced Institute Of Science And Technology
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WATANABE Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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AIKAWA Mami
School of Materials Science, Japan Advanced Institute of Science and Technology
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NARUSE Tetsuya
School of Materials Science, Japan Advanced Institute of Science and Technology
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UMEMOTO Shinya
School of Materials Science, Japan Advanced Institute of Science and Technology
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KAWADA Tsuyoshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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ABE Yukinari
School of Materials Science, Japan Advanced Institute of Science and Technology
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Kuniya T
School Of Materials Science Japan Advanced Institute Of Science And Technology
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YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
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KANEKO Satoru
Kanagawa Industrial Technology Research Institute
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OKAMOTO Shoji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology Hokuriku
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MIYOSHI Seiji
School of Materials Science, Japan Advanced Institute of Science and Technology, Hokuriku
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Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
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TODA Takeo
School of Materials Science, Japan Advanced Institute of Science and Technology
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KASAGAWA Hiroshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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Watanabe T
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Miyoshi Seiji
School Of Materials Science Japan Advanced Institute Of Science And Technology Hokuriku
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Igarashi Makoto
Institute Of Fluid Science Tohoku University
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Nishioka Kensuke
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Okamoto Shoji
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
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Toda Takeo
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Aikawa Mami
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Abe Yukinari
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Kawada Tsuyoshi
Graduate School Of Environmental Studies Tohoku University
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Naruse Tetsuya
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Murakawa Masakazu
Faculty of Technology, Kanazawa University
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Fujiyama Takaharu
Faculty of Technology, Kanazawa University
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Kaneko Satoru
Kanagawa Industrial Technol. Center Kanagawa Jpn
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Okamoto Shoji
Department Of Dermatology School Of Medicine Chiba University
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Yokoyama S
Kyushu Univ. Fukuoka Jpn
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Huang Chi-hsien
Institute Of Fluid Science Tohoku University
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Kasagawa Hiroshi
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Murakawa Masakazu
Faculty Of Technology Kanazawa University:(present Address)nippon Kokan K.k.
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Fujiyama Takaharu
Faculty Of Technology Kanazawa University:(present Address)intel Japan K.k.
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Watanabe Takayuki
Department Of Biochemistry School Of Dentistry Hokkaido University
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Kaneko Satoru
Kanagawa Industrial Technology Research Institute, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Seiji Samukawa
Institute of Fluid Science, Tohoku University, 2-1-1 Katahiara, Aoba-ku, Sendai 980-8577, Japan
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Takashi Fuyuki
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Yukiharu Uraoka
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Masaki Takeguchi
High Voltage Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
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Makoto Igarashi
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Nishioka Kensuke
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Akiyama Kensuke
Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Ichiro Yamashita
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Khoa Tran
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan
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Toriyabe Koichi
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Horita Susumu
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Horita Susumu
School of Materials Science, Japan Advanced Institute of Science and Technology, Hokuriku, Tatsunokuchi, Ishikawa 923-1292, Japan
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Susumu Horita
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Horii Sadayoshi
School of Materials Science, Japan Advanced Institute of Science and Technology, Hokuriku, Tatsunokuchi, Ishikawa 923-1292, Japan
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Hana Sukreen
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
著作論文
- Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
- Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
- Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
- Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
- Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
- Enhancement of Crystallization of an Si Film on a Quartz Substrate by Thermal Electron Irradiation : Surfaces, Interfaces, and Films
- Epitaxial Growth of a (101) Pb(Zr_xTi_)O_3 Film on an Epitaxial (110) Ir/(100) ZrN/(100) Si Substrate Structure
- Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
- Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering
- Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
- Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application
- HF and Hydrazine Monohydrate Solution Treatment for Suppressing Oxidation of ZrN Film Surface : Surfaces. Interfaces, and Films
- Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers
- Low-Temperature Deposition of Silicon Oxide Film from the Reaction of Silicone Oil Vapor and Ozone Gas
- Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
- Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
- Material Properties of Heteroepitaxial Ir and Pb(ZrxTi1-x)O3 Films on (100)(ZrO2)1-x(Y2O3)x/(100)Si Structure Prepared by Sputtering