OKAMOTO Shoji | Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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概要
- Saito Keisukeの詳細を見る
- 同名の論文著者
- Department of Innovative and Engineered Materials, Tokyo Institute of Technologyの論文著者
関連著者
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OKAMOTO Shoji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Okamoto Shoji
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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WATANABE Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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YOKOYAMA Shintaro
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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SAITO Keisuke
BRUKER AXS K.K.
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KANEKO Satoru
Kanagawa Industrial Technology Research Institute
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AKIYAMA Kensuke
Kanagawa Industrial Technology Research Institute
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Watanabe T
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Yokoyama S
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Okamoto Shoji
Department Of Dermatology School Of Medicine Chiba University
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Funakubo H
Tokyo Inst. Technol. Yokohama Jpn
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舟窪 浩
東京工業大学大学院 総合理工学研究科 物質科学創造専攻
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SAITO Keisuke
Application Laboratory
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Saito K
Institute Of Industrial Science University Of Tokyo
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Shimizu Yoshitada
Kanagawa Industrial Technology Research Institute
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OHYA Seishiro
Kanagawa Industrial Technology Research Institute
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ITO Takeshi
Kanagawa Industrial Technology Research Institute
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YASAKA Shinji
Kanagawa Industrial Technology Research Institute
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MITSUHASHI Masahiko
Kanagawa Industrial Technology Research Institute
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NISHIDA Ken
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology
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KATODA Takashi
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Fujisawa Hironori
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Hitneji
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Fujisawa Hironori
Graduate School Of Engineering University Of Hyogo
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Takahashi K
Dep. Of Electronic And Photonic Systems Engineering Kochi Univ. Of Technol.
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Ohya S
Kanagawa Industrial Technology Research Institute (kitri)
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Saito K
Akita Univ. Akita Jpn
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藤沢 浩訓
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Saito Keisuke
Bruker Axs K. K.
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Saito Keisuke
Application Laboratory Bruker Axs
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Saito Kaichi
Kanagawa Industrial Technology Center
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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TAKAHASHI Kenji
Department of Radiological Life Sciences, Hirosaki University Graduate School of Health Sciences
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UCHIDA Hiroshi
Department of Materials and Life Sciences, Sophia University
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NAGAI Atsushi
Department of Internal Medicine-1, Tokyo Women's Medical University
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Osada Minoru
Advanced Materials Laboratory National Institute For Materials Science
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Katoda Takashi
Dep. Of Electronic And Photonic Systems Engineering Kochi Univ. Of Technol.
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Uchida H
Department Of Chemistry Faculty Of Science And Technology Sophia University
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Sakata Osami
Materials Science Division Japan Synchrotron Radiation Research Institute (jasri Spring-8)
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HONDA Yoshihisa
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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ASANO Gouji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Osada Minoru
Advanced Materials Laboratory National Institute For Materials Science (nims)
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YUASA Hiroyasu
Kanagawa Industrial Technology Research Institute
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FUNAKUBO Hiroshi
Kanagawa Industrial Technology Research Institute
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SAITO Keisuke
PANalytical Japan
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)nhk Science And Technical Researc
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HANEDA Hajime
National Institute for Materials Science
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OKAMOTO Satoshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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KODA Seiichiro
Department of Chemistry, Faculty of Science and Technology, Sophia University
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MINAMIDATE Jun
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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OHASHI Naoki
National Institute for Material Science
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KIMURA Shigeru
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, SPring-8)
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UENO Risako
Department of Innovative Engineered Materials, Tokyo Institute of Technology
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Funakubo Hiroshi
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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WADA Syunshuke
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology
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Wada Syunshuke
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Yuasa Hiroyasu
Kanagawa Industrial Technology Center Kanagawa Prefectural Government
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Watanabe T
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Ueno Risako
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nishida Ken
Dep. Of Communications Engineering National Defense Acad.
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Nishida Ken
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Ohashi N
National Inst. For Materials Sci.
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Akiyama K
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Minamidate Jun
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Katoda Takashi
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Watanabe Takeo
Univ. Hyogo Hyogo Jpn
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Kaneko Satoru
Kanagawa Industrial Technol. Center Kanagawa Jpn
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ITO Takeshi
Core Research for Evolutional Science and Technology (CREST) of Japan Science and Technology (JST)
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Watanabe Takayuki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Koda Seiichiro
Department Of Chemical Engineering Facutly Of Engineering The University Of Tokyo
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Okamoto Shoji
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Yokoyama Shintaro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Uchida Hiroshi
Department Of Earth System Science And Technology Interdisciplinary Graduate School Of Engineering S
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Mitsuya Masatoshi
Kanagawa Industrial Technology Research Institute
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Mitsuya Masatoshi
Kanagawa Industrial Technology Center
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Ito Takeshi
Kanagawa Industrial Technology Research Institute (kitri)
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Watanabe Takayuki
Department Of Chemical Engineering Tokyo Institute Of Technology
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Uchida Hiroshi
Department Of Anesthesia Tottori Prefectural Central Hospital
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Uchida Hiroshi
Department Of Chemistry Faculty Of Science And Technology Sophia University
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Watanabe Takayuki
Department Of Biochemistry School Of Dentistry Hokkaido University
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Watanabe Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Nishida Ken
Department of Communicating Engineering, National Defense Academy, Yokosuka, Kanagawa 239-8686, Japan
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Akiyama Kensuke
Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Mitsuhashi Masahiko
Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan
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ITO Takeshi
Kanagawa Industrial Technology Center
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Katoda Takashi
Department of Electronic and Photonic System Engineering, Kochi University of Technology, 185 Tosayamada-cho, Kami, Kochi 782-8502, Japan
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Ohya Seishiro
Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan
著作論文
- Epitaxial Yttria-stabilized Zirconia (YSZ) Film Deposited on Si(100) Substrate by YAG Laser
- Effect of Buffer Layer on Epitaxial Growth of YSZ Deposited on Si Substrate by Slower Q-switched 266nm YAG Laser
- Strong Dependence on Thickness of Room-Temperature Dielectric Constant of (100)-Oriented Pb(Mg_Nb_)O_3 Epitaxial Films Grown by Metal Organic Chemical Vapor Deposition
- Preparation and Structural Analysis of Micro-patterned Pb(Zr,Ti)O_3 Film by Metalorganic Chemical Vapor Deposition
- Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
- Raman Spectroscopic Characterization of Tetragonal PbZr_xTi_O_3 Thin Films : A Rapid Evaluation Method for c-Domain Volume
- Crystal Orientation Dependence on Electrical Properties of Pb(Zr, Ti)O_3 Thick Films Grown on Si Substrates by Metalorganic Chemical Vapor Deposition