Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_<1-x>) O_3 Films on (100) (ZrO_2)_<1-x>(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-09-01
著者
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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HORII Sadayoshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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UMEMOTO Shinya
School of Materials Science, Japan Advanced Institute of Science and Technology
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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堀井 將
北陸先端科学技術大学院大学 材料科学研究科
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Umemoto Shinya
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Horii Sadayoshi
School Of Material Science Japan Advanced Institute Of Science And Technology
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