スパッタ法によるシリコン基板上へのPb(Zr,Ti)O_3(PZT)薄膜のヘテロエピタキシャル成長
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概要
著者
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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堀田 將
北陸先端科学技術大学院大学材料科学研究科
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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堀井 將
北陸先端科学技術大学院大学 材料科学研究科
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