Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-15
著者
-
堀田 将
北陸先端科学技術大学院大学材料科学研究科
-
Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
-
KUNIYA Takuji
School of Materials Science, Japan Advanced Institute of Science and Technology
-
Kuniya T
School Of Materials Science Japan Advanced Institute Of Science And Technology
-
Kuniya Takuji
School Of Material Science Japan Advanced Institute Of Science And Technology
-
Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
-
堀井 將
北陸先端科学技術大学院大学 材料科学研究科
関連論文
- 直線偏光Nd:YAGレーザーによる規則性配列微細Siドットの形成(半導体Si及び関連材料・評価)
- Periodic Grain-Boundary Formation in a Poly-Si Thin Film Crystallized by Linearly Polarized Nd: YAG Pulse Laser with an Oblique Incident Angle
- Analysis on Operation of a F-FET Memory With an Intermediate Electrode
- Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
- Alignment of Grain Boundary in a Si film Crystallized by a Linearly Polarized Laser Beam on a Glass Substrate
- HF+ヒドラジン溶液処理をしたエピタキシャル(100)ZrN/(100)Si構造上への(100)Ir薄膜の作製
- 高コヒーレント直線偏光パルスレーザービームによる結晶化Si薄膜の粒界位置制御
- Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
- エピタキシャルZrN膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
- エピタキシャルZrN薄膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
- (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
- (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
- スパッタ法によるシリコン基板上へのPb(Zr,Ti)O_3(PZT)薄膜のヘテロエピタキシャル成長
- Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
- 反応性スパッタ法によるSi基板上へのY組成制御YSZ薄膜のヘテロエピタキシャル成長
- Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
- Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
- Enhancement of Crystallization of an Si Film on a Quartz Substrate by Thermal Electron Irradiation : Surfaces, Interfaces, and Films
- Determination of Material Thermal Properties Using Photoacoustic Signals Detected by a Transparent Transducer
- Analysis of Pyroelectric Signal in Photoacoustic Spectroscopy Using a Transparent Transducer
- Influence of Piezoelectric and Pyroelectric Effects on Signal of PAS Using a Transparent Transducer : Photoacoustic Spectroscopy and Ultrasonic Imaging
- Epitaxial Growth of a (101) Pb(Zr_xTi_)O_3 Film on an Epitaxial (110) Ir/(100) ZrN/(100) Si Substrate Structure
- Theoretical Analysis of Photoacoustic Signal on PAS Using a Transparent Transducer : Photoacoustic Effect and Spectroscopy
- Consideration on PA Signals of Multilayer Structure Measured by PAS Using Transparent Transducer : Photoacoustic Spectroscopy
- High-Critical-Current-Density Epitaxial Films of SmBa_2Cu_3O_ in High Fields
- Reduction of Surface Resistance of ErBa_2Cu_3O_ Films by BaZrO_3 Nano-Particle Inclusion
- Tri-axial Grain Orientation of Y_2Ba_4Cu_7O_y Achieved by the Magneto-science Method
- Rare-Earth-Dependent Magnetic Anisotropy in REBa_2Cu_3O_y
- Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
- High pressure water vapor annealing for improving HfSiO dielectrics properties
- Moire Fringe Analysis of BaZrO_3 Nanorods in ErBa_2Cu_3O_ Films
- Critical Current Density Enhancement around a Matching Field in ErBa_2Cu_3O_ Films with BaZrO_3 Nano-Rods
- Dislocation Density and Critical Current Density of Sm_Ba_Cu_3O_y Films Prepared by Various Fabrication Processes
- c-Axis-Correlated Vortex Pinning Center Induced by Dilute Co-doping in Pulsed-Laser-Deposition-ErBa_2Cu_3O_y Films
- Enhancement of Flux-Pinning in Epitaxial Sm_Ba_Cu_3O_y Films by Introduction of Low-T_c Nanoparticles
- High-Critical-Current-Density SmBa_2Cu_3O_ Films Induced by Surface Nanoparticle
- Hetero-Epitaxial Growth of CeO_2 Films on MgO Substrates
- Critical Current Control in YBa_2Cu_3O_ Films Using Artificial Pinning Centers
- Anisotropy and Lorentz-Force Dependences of Critical Current Density in C-Axis-Oriented YBa_2Cu_3O_ Thin Film
- Enhancement of Critical Current Density in ErBa_2Cu_3O_y Thin Films by Post-Annealing
- Evaluation of Multilayer Structure and Depth Profile by PAS Using a Transparent Transducer : Photoacoustic Spectroscopy
- Evaluation of Ion Implantation into Silicon Photoacoustic Spectroscopy using Transparent Transducer Method : Photoacoustic Spectroscopy
- Improving High-κ Gate Dielectric Properties by High-Pressure Water Vapor Annealing
- Thickness Dependence of Material Properties of Epitaxial Pb(Zr_xTi_)O_3 Films on Ir/(100) (ZrO_2)_(Y_2O_3)_x(100)Si Structures
- New Series of Nickel-Based Pnictide Oxide Superconductors (Ni_2Pn_2)(Sr_4Sc_2O_6) (Pn = P, As)
- Dramatic Change in Magnetization Behaviors of La_Sr_Mn_2O_ by Control of Excess Oxygen
- Thermoelectric Performance of Magnetically c-Axis Aligned Ca-based Cobaltites
- Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
- Metalorganic Chemical Vapor Deposition of HfO_2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen
- Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering
- Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
- Effect of Nitrogen on Electrical and Physical Properties of Polyatomic Layer Chemical Vapor Deposition HfSi_xO_y Gate Dielectrics
- Atomic-scale Characterization and Control of the HfO_2/Si(001) Interface
- Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
- Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application
- HF and Hydrazine Monohydrate Solution Treatment for Suppressing Oxidation of ZrN Film Surface : Surfaces. Interfaces, and Films
- Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers
- Low-Temperature Deposition of Silicon Oxide Film from the Reaction of Silicone Oil Vapor and Ozone Gas
- Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
- Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
- Material Properties of Heteroepitaxial Ir and Pb(ZrxTi1-x)O3 Films on (100)(ZrO2)1-x(Y2O3)x/(100)Si Structure Prepared by Sputtering