Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
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概要
- 論文の詳細を見る
Silicon dioxide etching in an inductively coupled plasma (ICP) using a multispiral coil (MSC) has been studied on the basis of CF x (x=1, 2) radical measurement employing a laser-induced fluorescence (LIF) technique. Fundamental radical behaviors in the MSC-ICP including a pulsed operation have been investigated for CF4 gas chemistry; radical composition and distribution are strongly dependent on chamber wall conditions and on the pulse modulation period as well as the time-averaged ICP power, because of dissociation and extinction kinetics. Moreover, radical behaviors in fluorocarbon plasmas including C4F8 and CHF3 have been examined in relation to the SiO2 etching characteristics. The dependence of radical densities on gas chemistry and on ICP power in the MSC-ICP has been characterized and has been found to correlate with the SiO2 etch rate and selectivity to Si. The results demonstrate that the control of radical behavior is crucial in realizing selective SiO2 etching using the MSC-ICP.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-30
著者
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Hayashi Shinji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
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Hayashi S
Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University
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Hayashi Shigenori
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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Hayashi Shigenori
Faculty Of Engineering Osaka University
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NAKAGAWA Hideo
Association of Super-Advanced Electronics Technologies (ASET)
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Kubota M
Opto-electronics Laboratories Oki Electric Industry Co. Ltd.
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Nakagawa Hideo
Association Of Super-advanced Electronics Technologies(aset)
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Yamanaka Michinari
Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd.
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Yamanaka M
Electron Devices Division Electrotechnical Laboratory
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KUBOTA Masafumi
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Kubota Masafumi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yamanaka Michinari
Semiconductor Research Center, Matsushita Electric Ind. Co. Ltd.,
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