Characterization of GdBa_2Cu_3O_<7-δ> Thin Films by Raman Scattering

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概要

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• Raman spectra of GdBa_2Cu_3O_<7-δ> thin films (ortho-I, ortho-II and tetra) deposited on MgO substrates by rf magnetron sputtering were measured with an incident light beam whose direction was parallel or perpendicular to the c-axis. The oxygen content was estimated from the frequency of the Cu-O axial stretching mode for these films. The bending mode associated with oxygen at 〜320 cm^<-1> shows the Fano-type asymmetry for all three films indicating the strong electronphonon interaction in this system. This mode softens at around T_c with decreasing temperature for the ortho-I sample whereas it shifts upwards monotonically for the ortho-II and tetra samples. Comparison of this temparature dependence with that of YBa_2Cu_3O_<7-δ> indicates that the softening of this mode is characteristic for the ortho-I phase.

• 社団法人応用物理学会の論文
• 1990-05-20

著者

• HAYASHI Shigenori

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• WASA Kiyotaka

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• Wasa K

  Res. Inst. Innovative Technol. Earth Kyoto Jpn

• Wasa Kiyotaka

  Research Institute Of Innovative Technology For The Earth

• NAKASHIMA Shin-ichi

  Department of Applied Physics,Osaka University

• Hasegawa Noboru

  Department Of Health And Nutrition Faculty Of Home Economics Gifu Women's University

• Hasegawa Noboru

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Hayashi Shinji

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University

• HANGYO Masanori

  Department of Applied Physics, Faculty of Engineering, Osaka University

• Hayashi S

  Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University

• Hayashi Shigenori

  Faculty Of Engineering Osaka University:central Research Laboratories Matsushita Electric Industrial

• Hayashi Shigenori

  Central Research Laboratories Matsushita Electric Ind. Co.

• Hayashi Shigenori

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation

• Hayashi Shigenori

  Faculty Of Engineering Osaka University

• Hayashi S

  Saga Univ. Saga Jpn

• Wasa Kiyotaka

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Hangyo M

  Research Center For Superconductor Photonics Osaka University

• Hangyo Masanori

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Hangyo Masanori

  Department Of Applied Physics Osaka University

• Hangyo Masanori

  Department Of Physics Faculty Of Science Kyoto University

• Nakashima S

  Ntt Telecommunications Energy Lab. Atsugi Jpn

• Nakashima Shin-ichi

  Department Of Applied Physics Faculty Of Engineering Osaka University

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