Determination of Material Thermal Properties Using Photoacoustic Signals Detected by a Transparent Transducer

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-05-30

著者

• 堀田 将

  北陸先端科学技術大学院大学材料科学研究科

• Horita Susumu

  Faculty Of Technology Kanazawa University

• HATA Tomonobu

  Faculty of Technology, Kanazawa University

• KONISHI Hideaki

  Faculty of Technology, Kanazawa University

• MIYABO Naoki

  Faculty of Technology, Kanazawa University

• Hata Toshio

  Electrotechnical Laboratory:tokai University

• Hayashi Shigenori

  Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.

• Konishi Hideaki

  Faculty Of Technology Kanazawa University

• Konishi Hideaki

  Faculty Of Engineering Kanazawa University

• Miyabo Naoki

  Faculty Of Technology Kanazawa University

• 堀井 將

  北陸先端科学技術大学院大学 材料科学研究科

• Hata T

  Kanazawa Univ. Kanazawa Jpn

• Hata Tomonobu

  Faculty Of Engineering Kanazawa University

関連論文

• 直線偏光Nd:YAGレーザーによる規則性配列微細Siドットの形成(半導体Si及び関連材料・評価)
• Periodic Grain-Boundary Formation in a Poly-Si Thin Film Crystallized by Linearly Polarized Nd: YAG Pulse Laser with an Oblique Incident Angle
• Analysis on Operation of a F-FET Memory With an Intermediate Electrode
• Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
• Alignment of Grain Boundary in a Si film Crystallized by a Linearly Polarized Laser Beam on a Glass Substrate
• HF+ヒドラジン溶液処理をしたエピタキシャル(100)ZrN/(100)Si構造上への(100)Ir薄膜の作製
• 高コヒーレント直線偏光パルスレーザービームによる結晶化Si薄膜の粒界位置制御
• Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
• エピタキシャルZrN膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
• エピタキシャルZrN薄膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
• (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
• (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
• スパッタ法によるシリコン基板上へのPb(Zr,Ti)O_3(PZT)薄膜のヘテロエピタキシャル成長
• Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
• 反応性スパッタ法によるSi基板上へのY組成制御YSZ薄膜のヘテロエピタキシャル成長
• Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
• Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
• Optical and Thermal Evaluation of Semiconductor by Differential Photothermal Deflection Spectroscopy : Photoacoustic Spectroscopy and Ultrasonic Imaging
• Determination of Material Thermal Properties Using Photoacoustic Signals Detected by a Transparent Transducer
• Analysis of Pyroelectric Signal in Photoacoustic Spectroscopy Using a Transparent Transducer
• Influence of Piezoelectric and Pyroelectric Effects on Signal of PAS Using a Transparent Transducer : Photoacoustic Spectroscopy and Ultrasonic Imaging
• Theoretical Analysis of Photoacoustic Signal on PAS Using a Transparent Transducer : Photoacoustic Effect and Spectroscopy
• Consideration on PA Signals of Multilayer Structure Measured by PAS Using Transparent Transducer : Photoacoustic Spectroscopy
• Reduction of Internal Stress by Compositional Gradient Layer Inserted between TiSi_2 and Si
• High-Critical-Current-Density Epitaxial Films of SmBa_2Cu_3O_ in High Fields
• Reduction of Surface Resistance of ErBa_2Cu_3O_ Films by BaZrO_3 Nano-Particle Inclusion
• Tri-axial Grain Orientation of Y_2Ba_4Cu_7O_y Achieved by the Magneto-science Method
• Rare-Earth-Dependent Magnetic Anisotropy in REBa_2Cu_3O_y
• Distributed Feed Back Surface Emitting Laser Diode with Multilayered Heterostructure
• GaAs/Al_xGa_As Multilayer Reflector for Surface Emitting Laser Diode
• High pressure water vapor annealing for improving HfSiO dielectrics properties
• Moire Fringe Analysis of BaZrO_3 Nanorods in ErBa_2Cu_3O_ Films
• Critical Current Density Enhancement around a Matching Field in ErBa_2Cu_3O_ Films with BaZrO_3 Nano-Rods
• Dislocation Density and Critical Current Density of Sm_Ba_Cu_3O_y Films Prepared by Various Fabrication Processes
• c-Axis-Correlated Vortex Pinning Center Induced by Dilute Co-doping in Pulsed-Laser-Deposition-ErBa_2Cu_3O_y Films
• Enhancement of Flux-Pinning in Epitaxial Sm_Ba_Cu_3O_y Films by Introduction of Low-T_c Nanoparticles
• High-Critical-Current-Density SmBa_2Cu_3O_ Films Induced by Surface Nanoparticle
• Hetero-Epitaxial Growth of CeO_2 Films on MgO Substrates
• Critical Current Control in YBa_2Cu_3O_ Films Using Artificial Pinning Centers
• Anisotropy and Lorentz-Force Dependences of Critical Current Density in C-Axis-Oriented YBa_2Cu_3O_ Thin Film
• Enhancement of Critical Current Density in ErBa_2Cu_3O_y Thin Films by Post-Annealing
• Evaluation of Multilayer Structure and Depth Profile by PAS Using a Transparent Transducer : Photoacoustic Spectroscopy
• Evaluation of Ion Implantation into Silicon Photoacoustic Spectroscopy using Transparent Transducer Method : Photoacoustic Spectroscopy
• Improving High-κ Gate Dielectric Properties by High-Pressure Water Vapor Annealing
• Target for a Pb(Zr,Ti)O_3 Thin Film Deposited at a Low Temperature Using a Quasi-Metallic Mode of Reactive Sputtering
• Thickness Dependence of Material Properties of Epitaxial Pb(Zr_xTi_)O_3 Films on Ir/(100) (ZrO_2)_(Y_2O_3)_x(100)Si Structures
• New Series of Nickel-Based Pnictide Oxide Superconductors (Ni_2Pn_2)(Sr_4Sc_2O_6) (Pn = P, As)
• Dramatic Change in Magnetization Behaviors of La_Sr_Mn_2O_ by Control of Excess Oxygen
• Thermoelectric Performance of Magnetically c-Axis Aligned Ca-based Cobaltites
• Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
• Metalorganic Chemical Vapor Deposition of HfO_2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen
• Effect of Nitrogen on Electrical and Physical Properties of Polyatomic Layer Chemical Vapor Deposition HfSi_xO_y Gate Dielectrics
• Atomic-scale Characterization and Control of the HfO_2/Si(001) Interface
• High Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering Technique : Communication Devices and Materials
• Change in the characteristics of amorphous As_2S_3 induced by injected acoustic domains : Physical Acoustics
• Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
• High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering technique : C-2: SURFACE WAVE AND MAGNETIC DEVICES
• Evaluation of Optical Absorption Coefficient of Si by Photothermal Spectroseopy Using Transparent Pyroelectric Transducer
• Feasibility of Ultra-Thin Films for Gate Insulator by Limited Reaction Sputtering Process(Recent Progress in Oxide Thin Films by Sputtering)
• High Rate and Low Temperature Deposition of Co-Cr Films by Exposed Pole Magnetron Co-Sputtering System
• Optical-Transmission Modulation in CdS Caused by Off-Axis Acoustoelectric Domain
• Propose of New Mixture Target for Low Temperature and High Rate Deposition of PZT Thin Films by Reactive Sputtering
• New Control Method of CdS High Field Demain Velocity Induced by Injected Acoustic Flux
• Mechanisms of Transmitted Optical Modulation Caused by Acoustic Flux in CdS
• Threshold Electric Field for Domain Formation in Semiconductive CdS
• Measurement of Nonlinear Acoustic Gain in CdS
• Electrical Properties of Low-Temperature (45O℃) Pb(Zr, Ti)O_3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering
• Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr, Ti)O_3 Films
• Low-Temperature Fabrication of Pb(Zr, Ti)O_3 Films by RF Reactive Sputtering Using Zr/Ti+PbO Target
• Study on Differential Photothermal Deflection Spectroscopy (PDS) Considering the Intensity Profile of a Probe Beam

もっと見る 閉じる

スポンサーリンク