High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering technique : C-2: SURFACE WAVE AND MAGNETIC DEVICES
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1979-03-01
著者
-
HATA Tomonobu
Faculty of Technology, Kanazawa University
-
MINAMIKAWA Toshiharu
Department of Electrical and Computer Engineering, Faculry of Engineering, Kanazawa University
-
Hata Tomonobu
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
-
Minamikawa Toshiharu
Department Of Electrical Engineering Faculty Of Technology
-
MORIMOTO Osamu
Toyama Technical College
-
HADA Toshio
Toyama Technical College
-
Morimoto Osamu
Department Of Mechanical Engineering Kobe University
-
Hada Toshio
Department Of Electrical Engineering Faculty Of Technology Kanazawa University
-
ODA EtsujiN
Department of Electrical Engineering, Faculty of Technology
-
Oda Etsujin
Department Of Electrical Engineering Faculty Of Technology
関連論文
- High Rate and Low Radiation Damage Film Deposition by Compressed Magnetic Field (CMF) Magnetron Sputtering : C-4: THIN FILM DEVICES
- Studies on Positive Ion Behavior in Reactive Sputtering of Yttria-Stabilized Zirconia (YSZ)
- Optical and Thermal Evaluation of Semiconductor by Differential Photothermal Deflection Spectroscopy : Photoacoustic Spectroscopy and Ultrasonic Imaging
- Determination of Material Thermal Properties Using Photoacoustic Signals Detected by a Transparent Transducer
- Analysis of Pyroelectric Signal in Photoacoustic Spectroscopy Using a Transparent Transducer
- Influence of Piezoelectric and Pyroelectric Effects on Signal of PAS Using a Transparent Transducer : Photoacoustic Spectroscopy and Ultrasonic Imaging
- Theoretical Analysis of Photoacoustic Signal on PAS Using a Transparent Transducer : Photoacoustic Effect and Spectroscopy
- Consideration on PA Signals of Multilayer Structure Measured by PAS Using Transparent Transducer : Photoacoustic Spectroscopy
- Reduction of Internal Stress by Compositional Gradient Layer Inserted between TiSi_2 and Si
- Evaluation of Multilayer Structure and Depth Profile by PAS Using a Transparent Transducer : Photoacoustic Spectroscopy
- Evaluation of Ion Implantation into Silicon Photoacoustic Spectroscopy using Transparent Transducer Method : Photoacoustic Spectroscopy
- Target for a Pb(Zr,Ti)O_3 Thin Film Deposited at a Low Temperature Using a Quasi-Metallic Mode of Reactive Sputtering
- Annealing Temperature Dependence of MgO Substrates on the Quality of YBa_2Cu_3O_x Films Prepared by Pulsed Laser Ablation
- The Behavior of an Immiscible Equal-Density Liquid Two-Phase Flow in a Horizontal Tube
- Evaluation of Optical Absorption Coefficients of a-SiN:H Films by Photothermal Deflection Spectroscopy(PDS) : Photoacoustic Spectroscopy
- High Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering Technique : Communication Devices and Materials
- Change in the characteristics of amorphous As_2S_3 induced by injected acoustic domains : Physical Acoustics
- Reduction of Droplet Formatiom by Reducing Target Etching Rate in Pulsed Laser Ablation
- Laser-Irradiation Induced a-Axis Orientation in c-Axis-Oriented YBa_2Cu_3O_x Films Prepared by Pulsed Laser Ablation
- Optical Transmission Modulation Mechanisms Caused by Acoustic Domains in CdS : Physical Acoustics II
- High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering technique : C-2: SURFACE WAVE AND MAGNETIC DEVICES
- Photoacoustic Measurement of CdS by Transparent Transducer Method : Physical Acoustics
- Deposition of Epitaxial Yittria-Stabilized Zirconia (YSZ) on Si(100) and Simultaneous Growth of Amorphous SiO_2 Interlayer
- Observation of Surface Roughness by PAS using Transparent Transducer and Photothermal Deflection Spectroscopy (PDS) : Photoacoustic Spectroscopy
- A STUDY ON SENSITIVITY TESTING OF OVARIAN CANCER CELLS TO ANTICANCER CHEMOTHERAPY : WITH SPECIAL REFERENCE TO THE USE OF LDH AND ITS ISOZYMES AS INDICATORS
- Propose of New Mixture Target for Low Temperature and High Rate Deposition of PZT Thin Films by Reactive Sputtering
- Growth Dependence of Reactively Sputtered Yttria-Stabilized Zirconia on Si(100), (110), (111) Substrates
- Lattice Attenuations in CdS Measured by Acoustic Domains
- Frequency Spectrum of Acoustic Domain Caused by Variable Rise-Time Pulse : Physical Acoustics II
- New Control Method of CdS High Field Demain Velocity Induced by Injected Acoustic Flux
- Low Temperature Deposition of Oriented C-Axis AlN Films on Glass Substrates by Reactive Magnetron Sputtering
- Evaluation of Si Thin Films by Photothermal Deflection Spectroscopy (PDS)
- The Loss Characteristics of a Semiconductor Travelling Wave Amplifier
- Electrical Properties of Low-Temperature (45O℃) Pb(Zr, Ti)O_3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering
- Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr, Ti)O_3 Films
- Low-Temperature Fabrication of Pb(Zr, Ti)O_3 Films by RF Reactive Sputtering Using Zr/Ti+PbO Target
- Photoacoustic Spectroscopy of CdS by Transducer Method : Physical Acoustics