Low Temperature Deposition of Oriented C-Axis AlN Films on Glass Substrates by Reactive Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-05-05
著者
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Takeda Fumio
Faculty Of Electrical Engineering Toyama Technical College
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Hata Tomonobu
Department Of Electrical Engineering Faculty Of Technology Kanazawa University
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Hata Tomonobu
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
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HATA Tomonobu
Department of Electrical Engineering, Faculty of Technology, Kanazawa University
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- Low Temperature Deposition of Oriented C-Axis AlN Films on Glass Substrates by Reactive Magnetron Sputtering
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- Electrical Properties of Low-Temperature (45O℃) Pb(Zr, Ti)O_3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering
- Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr, Ti)O_3 Films
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