High Rate and Low Radiation Damage Film Deposition by Compressed Magnetic Field (CMF) Magnetron Sputtering : C-4: THIN FILM DEVICES
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概要
- 論文の詳細を見る
- 1983-02-28
著者
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Hata Tomonobu
Department Of Electrical Engineering Faculty Of Technology Kanazawa University
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Hata Tomonobu
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
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Toriyama Keiji
Department Of Electrical Engineering Faculty Of Technology Kanazawa University
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KAWAHARA Junji
Department of Electrical Engineering, Faculty of Technology, Kanazawa University
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Kawahara Junji
Department Of Electrical Engineering Faculty Of Technology Kanazawa University
関連論文
- High Rate and Low Radiation Damage Film Deposition by Compressed Magnetic Field (CMF) Magnetron Sputtering : C-4: THIN FILM DEVICES
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- Propose of New Mixture Target for Low Temperature and High Rate Deposition of PZT Thin Films by Reactive Sputtering
- Growth Dependence of Reactively Sputtered Yttria-Stabilized Zirconia on Si(100), (110), (111) Substrates
- Frequency Spectrum of Acoustic Domain Caused by Variable Rise-Time Pulse : Physical Acoustics II
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- Evaluation of Si Thin Films by Photothermal Deflection Spectroscopy (PDS)
- The Loss Characteristics of a Semiconductor Travelling Wave Amplifier
- Electrical Properties of Low-Temperature (45O℃) Pb(Zr, Ti)O_3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering
- Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr, Ti)O_3 Films
- Low-Temperature Fabrication of Pb(Zr, Ti)O_3 Films by RF Reactive Sputtering Using Zr/Ti+PbO Target
- Photoacoustic Spectroscopy of CdS by Transducer Method : Physical Acoustics