Studies on Positive Ion Behavior in Reactive Sputtering of Yttria-Stabilized Zirconia (YSZ)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-03-15

著者

• ANDO Ryo

  Department of Forest and Forest Products Science, Faculty of Agriculture, Kyushu University

• Ando Ryo

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University

• MATSUDA Hideki

  Department of Otolaryngology, and Head and Neck Surgery, Yokohama City University School of Medicine

• Horita Susumu

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University

• HATA Tomonobu

  Department of Electrical and Computer Engineering, Faculty of Technology, Kanazawa University

• Hata Tomonobu

  Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University

• Matsuda Hideki

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University:(present

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• Studies on Positive Ion Behavior in Reactive Sputtering of Yttria-Stabilized Zirconia (YSZ)
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• Deposition of Epitaxial Yittria-Stabilized Zirconia (YSZ) on Si(100) and Simultaneous Growth of Amorphous SiO_2 Interlayer
• Observation of Surface Roughness by PAS using Transparent Transducer and Photothermal Deflection Spectroscopy (PDS) : Photoacoustic Spectroscopy
• Propose of New Mixture Target for Low Temperature and High Rate Deposition of PZT Thin Films by Reactive Sputtering
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• Electrical Properties of Low-Temperature (45O℃) Pb(Zr, Ti)O_3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering
• Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr, Ti)O_3 Films
• Low-Temperature Fabrication of Pb(Zr, Ti)O_3 Films by RF Reactive Sputtering Using Zr/Ti+PbO Target
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