Effect of Hydrogen Gas on c-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-03-05

著者

• Takeda Fumio

  Faculty Of Electrical Engineering Toyama Technical College

• MORI Teruki

  Faculty of Electrical Engineering, Toyama Technical College

• TAKAHASHI Takakazu

  Faculty of Technology, Toyama University

• Mori Teruki

  Faculty Of Electrical Engineering Toyama Technical College

• Takahashi Takakazu

  Faculty Of Engineering Kanazawa University

関連論文

• Effect of Hydrogen Gas on c-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering
• Reply to "Comments" by M. Kikuchi et al.
• Endotherm in Switch-on Process in Semiconducting Glasses
• High Rate and Low Temperature Deposition of Co-Cr Films by Exposed Pole Magnetron Co-Sputtering System
• Low Temperature Deposition of Oriented C-Axis AlN Films on Glass Substrates by Reactive Magnetron Sputtering
• Characteristics of Ion Beams Produced in a Plasma Focus Device
• Deposition of Amorphous CoZrNb Films Using CMF Magnetron Sputtering Technique

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