High Rate and Low Temperature Deposition of Co-Cr Films by Exposed Pole Magnetron Co-Sputtering System
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概要
- 論文の詳細を見る
Co-Cr films were successfully deposited using the exposed pole (EP) magnetron co-sputtering system, obtaining a larger leakage magnetic field, at a high rate (1400 Å/min) and a low substrate temperature (70℃) for a power density of 7.6 W/cm^2. Differences in the radial profiles of film thickness and Co content in the films were as small as 17% and 5wt.%, respectively within a 70 mm diameter of the films. The target utilization efficiency at the surface is more than 85 %. The films have a c-axis orientation of ?θ_<50>=8-10° and a perpendicular magnetization of Ms_⊥=550-670 emu/cc and Hc_⊥=250-300 Oe to the film plane.
- 社団法人応用物理学会の論文
- 1985-09-20
著者
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Hata Tomonobu
Faculty Of Engineering Kanazawa University
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TAKAHASHI Takakazu
Faculty of Technology, Toyama University
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Miyata Tsutomu
Faculty Of Technology Toyama University
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Yoshida Junsaku
Faculty of Technology, Toyama University
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Takahashi Takakazu
Faculty Of Engineering Kanazawa University
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Takahashi Takakazu
Faculty Of Technology Toyama University
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Yoshida Junsaku
Faculty Of Technology Toyama University
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