堀田 将 | 北陸先端科学技術大学院大学材料科学研究科
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概要
関連著者
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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堀井 將
北陸先端科学技術大学院大学 材料科学研究科
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HORII Shigeru
Department of Superconductivity, University of Tokyo
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Ichinose A
Central Res. Inst. Of Electric Power Ind. Kanagawa Jpn
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Yamada Y
Akita Univ. Akita Jpn
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Yoshida Yutaka
Department of Structural Pathology Institute of Nephrology, Graduate School of Medical and Dental Sc
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MATSUMOTO Kaname
Department of Materials Science, Graduate School of Engineering, Tohoku University
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Yamada Y
Superconductivity Research Laboratory International Superconductivity Technology Center
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向田 昌志
山形大学工学部電気電子工学科
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堀田 將
北陸先端科学技術大学院大学材料科学研究科
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Ichinose Ataru
Central Research Institute Of Electric Power Industry
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Kitazawa K
Department Of Superconductivity University Of Tokyo
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Mukaida Masashi
Kyushu Univ. Fukuoka Jpn
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MUKAIDA Masashi
Department of Electrical and Information Engineering, Yamagata University
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MATSUMOTO Kaname
Kyushu Institute of Technology
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Matsumoto Kaname
Department Of Materials Science And Engineering Kyushu Institute Of Technology
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KISHIO Kohji
Department of Superconductivity, Graduate School of Engineering, University of Tokyo
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Horita Susumu
Faculty Of Technology Kanazawa University
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SHIMOYAMA Jun-ichi
Department of Industrial Chemistry, University of Tokyo
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HATA Tomonobu
Faculty of Technology, Kanazawa University
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Hata Toshio
Electrotechnical Laboratory:tokai University
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Shimoyama J
Department Of Applied Chemistry The University Of Tokyo
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向田 昌志
九大工
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Sato J
Hitachi Cable Ltd. Ibaraki Jpn
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Yamada Y
Department Of Quantum Science And Energy Engineering Tohoku University
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Kishio Kohji
Department Of Applied Chemistry Faculty Of Engineering University Of Tokyo
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Yoshida Y
Department Of Energy Engineering And Science Nagoya University
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Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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堀井 貞義
北陸先端科学技術大学院大学材料科学研究科
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ICHINO Yusuke
Department of Energy and Science, Nagoya University
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Ito Y
Fukushima Technol. Center Fukushima Jpn
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TAKAI Yoshiaki
Department of Electronics Engineering, Nagoya University
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ICHINOSE Ataru
Electrical Physics Department, Komae Research Laboratory, Central Research Institute of Electric Pow
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ICHINO Yusuke
Nagoya University
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Ichino Yusuke
Department Of Electronics Nagoya University
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HORII Sadayoshi
Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.
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Kita Ryusuke
Department Of Electrical And Electronic Engineering Shizuoka University
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Ryusuke Kita
Department Of Electrical And Electronic Engineering Shizuoka University
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高井 義造
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Takai Yoshiaki
Depertment Of Electrical Engineering Nagoya University
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Takai Yoshiaki
Nagoya University
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HORII Shigeru
University of Tokyo
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MATSUMOTO Kaname
Kyoto University
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OGINO Hiraku
Department of Applied Chemistry, University of Tokyo
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PUNCHAIPETCH Prakaipetch
Graduate School of Materials Science, Nara Institute of Science and Technology
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MIURA Masashi
Department of Electrical Engineering and Computer Science, Nagoya University
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HORII Shigeru
JST-TRIP
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Ogino Hiraku
Department Of Applied Chemistry The University Of Tokyo
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Kita Ryusuke
Shizuoka University
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UCHIKOSHI Tetsuo
Nano Ceramics Center, National Institute for Materials Science
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SUZUKI Tohru
Nano Ceramics Center, National Institute for Materials Science
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向田 昌志
山形大
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YAGI Shuhei
Department of Physical Electronics, Tokyo Institute of Technology
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Adachi Seiji
Central Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Adachi Seiji
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Adachi S
Department Of Electronic Engineering Faculty Of Engineering Gunma University
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Adachi Sadao
Department Of Electronic Engineering Gunma University
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Itoh Masakazu
Department Of Energy Engineering And Science Nagoya University
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浦岡 行治
奈良先端科学技術大学院大
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KUNIYA Takuji
School of Materials Science, Japan Advanced Institute of Science and Technology
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横山 政司
北陸先端科学技術大学院大学 材料科学研究科
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HORII Sadayoshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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Sameshima Toshiyuki
Tokyo University Of Agriculture And Technology
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Adachi S
Gunma Univ. Gunma Jpn
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URAOKA Yukiharu
Graduate School of Materials Science, Nara Institute of Science and Technology
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FUYUKI Takashi
Graduate School of Materials Science, Nara Institute of Science and Technology
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Yagi S
Department Of Physical Electronics Tokyo Institute Of Technology
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Kita R
Shizuoka Univ. Hamamatsu Jpn
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Kita Ryusuke
Shizuoka Univ. Hamamatsu Jpn
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Suzuki Tohru
Fine Particle Processing Group Nano Ceramics Center National Institute For Materials Science
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Adachi S
Hiroshima Univ. Higashihiroshima Jpn
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Sakka Yoshio
National Inst. Materials Sci. Ibaraki Jpn
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Saito Atsushi
High Field Laboratory For Superconducting Materials Institute For Materials Research Tohoku Universi
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Kuniya Takuji
School Of Material Science Japan Advanced Institute Of Science And Technology
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YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
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Ishihara Atsushi
Department of Cardiovascular Medicine, The University of Tokyo Graduate School of Medicine
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Yamada Yuh
National Research Institute For Metals
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岩田 真
名大院工
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YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
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横山 政司
北陸先端科学技術大学院大学材料科学研究科
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KONISHI Hideaki
Faculty of Technology, Kanazawa University
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SAIKAWA Takeshi
Faculty of Technology, Kanazawa University
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YAGI Syuichi
Faculty of Technology, Kanazawa University
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Niwa M
Matsushita Electronics Corp. Kyoto Jpn
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HIROSE Fumihiko
Yamagata University
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Ishihara Atsushi
Department Of Applied Chemistry University Of Tokyo
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Yagi Syuhei
Department Of Physical Electronics Tokyo Institute Of Technology
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Iwata M
Meiji Seika Kaisha Ltd. Yokohama Jpn
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MUKAIDA Masashi
Yamagata University
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YOSHIDA Yutaka
Nagoya University
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SAITO Atsushi
Yamagata University
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OHSHIMA Shigetoshi
Yamagata University
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Uchikoshi Tetsuo
National Inst. Of Material Sci.
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Uchikoshi Tetsuo
Nano Ceramics Center National Institute For Materials Science
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Uchikoshi Tetsuo
Nano Ceramics Center National Institute For Materials Sciences (nims)
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Uchikoshi Tetsuo
National Institute For Materials Science
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HORIDE Tomoya
Kyoto University
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Adachi Satoru
Institute Of Laser Engineering Osaka University:(present Address)department Of Material Science Hime
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NIWA Masaaki
ULSI Process Technology Development Center, Matsushita Electronics Corp.
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OZAKI Toshinori
Department of Electrical Engineering and Computer Science, Nagoya University
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HORIDE Tomoya
Department of Materials Science and Engineering, Kyoto University
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ADACHI Sakae
Faculty of Technology, Kanazawa University
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Ishihara Atsushi
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Sameshima Toshiyuki
Tokyo A&t University
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Saikawa Takeshi
Faculty Of Technology Kanazawa University
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Konishi Hideaki
Faculty Of Technology Kanazawa University
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Konishi Hideaki
Faculty Of Engineering Kanazawa University
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Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
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Yagi Shin-ichi
Department Of Physical Electronics Tokyo Institute Of Technology
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Niwa M
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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Niwa M
Department Of Materials Science And Engineering Tokyo Denki University
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SAKKA Yoshio
World Premier International Research Center Initiative (WPI Initiative) on Materials Nanoarchitronic
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SHIN Woosuck
National Institute of Advanced Industrial Science and Technology (AIST), Advanced Manufacturing Rese
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MATSUBARA Ichiro
National Institute of Advanced Industrial Science and Technology (AIST), Advanced Manufacturing Rese
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畑山 智亮
Graduate School Of Materials Science Nara Institute Of Science And Technology
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OKAMOTO Takeshi
Graduate School of Systems and Information Engineering, University of Tsukuba
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増田 淳
北陸先端科学技術大学院大学材料科学研究科:(現)産業技術総合研究所
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YOKOYAMA Yoshihiko
Institute for Materials Research, Tohoku University
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MURAYAMA Norimitsu
National Institute of Advanced Industrial Science and Technology (AIST), Advanced Manufacturing Rese
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Yokoyama Yoshihiko
Institute For Materials Research Tohoku University
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Yamada Kazuhiro
Department of Hard Tissue Research, Matsumoto Dental University Graduate School of Oral Medicine
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Suzuki Masahito
Department of Cardiology, Musashino Red Cross Hospital
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OSAMURA Kozo
Department of Metallurgy,Kyoto University
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Horita Susumu
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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西岡 賢祐
北陸先端科学技術大学院大学材料科学研究科
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戸田 猛夫
北陸先端科学技術大学院大学材料科学研究科
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中田 靖則
北陸先端科学技術大学院大学材料科学研究科
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AIKAWA Mami
School of Materials Science, Japan Advanced Institute of Science and Technology
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NARUSE Tetsuya
School of Materials Science, Japan Advanced Institute of Science and Technology
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UMEMOTO Shinya
School of Materials Science, Japan Advanced Institute of Science and Technology
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渡部 幹雄
北陸先端科学技術大学院大学材料科学研究科
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成瀬 哲哉
北陸先端科学技術大学院大学材料科学研究科
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KAWADA Tsuyoshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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ABE Yukinari
School of Materials Science, Japan Advanced Institute of Science and Technology
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YANO Hiroshi
Graduate School of Materials Science, Nara Institute of Science and Technology
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HATAYAMA Tomoaki
Graduate School of Materials Science, Nara Institute of Science and Technology
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URAOKA Yukiharu
Nara Institute of Science and Technology
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FUYUKI Takashi
Nara Institute of Science and Technology
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KANEKO Kenji
Department of Material Science and Engineering, Graduate School of Engineering, Kyushu University
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Osamura Kozo
Department Of Metallurgy Kyoto University
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Shin W
National Inst. Of Advanced Industrial Sci. And Technol. Nagoya
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Shin Woosuck
National Industrial Research Institute Of Nagoya
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Yamamoto Y
College Of Engineering Hosei University
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Yamamoto Yuichi
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Kuniya T
School Of Materials Science Japan Advanced Institute Of Science And Technology
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MORI Nobuyuki
Kyushu University of Nursing and Social Welfare
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Yamamoto Y
Nippon Steel Corp. Kawasaki Jpn
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MIYABO Naoki
Faculty of Technology, Kanazawa University
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SAIGAWA Takeshi
Faculty of Technology, Kanazawa University
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Yamamoto Y
Nara Inst. Sci. And Technol. Nara Jpn
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FUNAHASHI Ryoji
National Institute of Advanced Industrial Science and Technology
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SHIKANO Masahiro
National Institute of Advanced Industrial Science and Technology
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ITO Masashi
Yamagata University
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KOIKE Kunihiro
Yamagata University
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増田 淳
北陸先端科学技術大学院大学材料科学研究科
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FUKUSHIMA Takayuki
Department of Applied Chemistry, University of Tokyo
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SAKKA Yoshio
WPI Center for Materials Nanoarchitectonics, National Institute for Materials and Science
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Yano H
Graduate School Of Materials Science Nara Institute Of Science And Technology
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YANO Hiroshi
Nara Institute of Science and Technology
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HATAYAMA Tomoaki
Nara Institute of Science and Technology
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Punchaipetch Prakaipetch
Nara Institute of Science and Technology
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Nakamura Hideki
Nara Institute of Science and Technology
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Horii Sadayoshi
Hitachi Kokusai Electric Inc.
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TOMOKIYO Yoshitsugu
Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
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MIURA Masashi
Nagoya University
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SHINGAI Yuki
Department of Materials Physics and Chemistry, Kyushu University
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TOH Shoichi
HVEM Laboratory, Kyushu University
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MORI Nobuyuki
Department of Materials Science and Engineering, Kyushu University
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MIURA Osuke
Tokyo Metropolitan University
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YAMADA Kazuhiro
Kyushu University
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Matsumura Yutaka
Department of Cardiology, Saitama Red Cross Hospital
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YOSHIDA Yutaka
University of Tokyo
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TAKAHASHI Yutaka
Yamagata University
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OHAZAMA Tohru
Department of Electrical and Information Engineering, Yamagata University
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Matsubara Ichiro
Government Industrial Research Institute Osaka
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Matsubara Ichiro
Department Of Energy Conversion Osaka National Research Institute
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Matsubara Ichiro
National Institute Of Advanced Industrial Science And Technology
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Murayama Norimitsu
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Advanced Manufacturing Res. Inst.
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Murayama Norimitsu
National Industrial Research Institute Of Nagoya
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Yamamoto Yoshitugu
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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Miyabo Naoki
Faculty Of Technology Kanazawa University
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Saigawa Takeshi
Faculty Of Technology Kanazawa University
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MIYASHITA Makoto
Graduate School of Materials Science, Nara Institute of Science and Technology
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Horii Sadayoshi
Delegated from Kokusai Electric Co., Ltd.
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Yokoyama Seiji
Japan Advanced Institute of Science and Technology, School of Material Science
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Nakajima Hideki
Japan Advanced Institute of Science and Technology, School of Material Science
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KATSURA Yukari
Department of Applied Chemistry, The University of Tokyo
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YOKOTA Yuui
Department of Applied Chemistry, University of Tokyo
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SANO Mitsuhiro
Department of Applied Chemistry School of Engineering, University of Tokyo
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FUJIE Kazuyuki
Department of Applied Chemistry School of Engineering, University of Tokyo
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SHIKANO Masahiro
PRESTO, Japan Science and Technology Corporation (JST)
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Aikawa Mami
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Niwa Masaaki
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Abe Yukinari
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Kawada Tsuyoshi
Graduate School Of Environmental Studies Tohoku University
著作論文
- 直線偏光Nd:YAGレーザーによる規則性配列微細Siドットの形成(半導体Si及び関連材料・評価)
- Periodic Grain-Boundary Formation in a Poly-Si Thin Film Crystallized by Linearly Polarized Nd: YAG Pulse Laser with an Oblique Incident Angle
- Analysis on Operation of a F-FET Memory With an Intermediate Electrode
- Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
- Alignment of Grain Boundary in a Si film Crystallized by a Linearly Polarized Laser Beam on a Glass Substrate
- HF+ヒドラジン溶液処理をしたエピタキシャル(100)ZrN/(100)Si構造上への(100)Ir薄膜の作製
- 高コヒーレント直線偏光パルスレーザービームによる結晶化Si薄膜の粒界位置制御
- Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
- エピタキシャルZrN膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
- エピタキシャルZrN薄膜/(100)Si基板上に形成したPZT薄膜の強誘電体特性
- (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
- (100)YSZ/(100)Si基板構造上にスパッタ法により形成したヘテロエピタキシャル(100)Ir及び(001)PZT薄膜の膜質特性
- スパッタ法によるシリコン基板上へのPb(Zr,Ti)O_3(PZT)薄膜のヘテロエピタキシャル成長
- Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
- 反応性スパッタ法によるSi基板上へのY組成制御YSZ薄膜のヘテロエピタキシャル成長
- Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
- Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
- Determination of Material Thermal Properties Using Photoacoustic Signals Detected by a Transparent Transducer
- Analysis of Pyroelectric Signal in Photoacoustic Spectroscopy Using a Transparent Transducer
- Influence of Piezoelectric and Pyroelectric Effects on Signal of PAS Using a Transparent Transducer : Photoacoustic Spectroscopy and Ultrasonic Imaging
- Theoretical Analysis of Photoacoustic Signal on PAS Using a Transparent Transducer : Photoacoustic Effect and Spectroscopy
- Consideration on PA Signals of Multilayer Structure Measured by PAS Using Transparent Transducer : Photoacoustic Spectroscopy
- High-Critical-Current-Density Epitaxial Films of SmBa_2Cu_3O_ in High Fields
- Reduction of Surface Resistance of ErBa_2Cu_3O_ Films by BaZrO_3 Nano-Particle Inclusion
- Tri-axial Grain Orientation of Y_2Ba_4Cu_7O_y Achieved by the Magneto-science Method
- Rare-Earth-Dependent Magnetic Anisotropy in REBa_2Cu_3O_y
- High pressure water vapor annealing for improving HfSiO dielectrics properties
- Moire Fringe Analysis of BaZrO_3 Nanorods in ErBa_2Cu_3O_ Films
- Critical Current Density Enhancement around a Matching Field in ErBa_2Cu_3O_ Films with BaZrO_3 Nano-Rods
- Dislocation Density and Critical Current Density of Sm_Ba_Cu_3O_y Films Prepared by Various Fabrication Processes
- c-Axis-Correlated Vortex Pinning Center Induced by Dilute Co-doping in Pulsed-Laser-Deposition-ErBa_2Cu_3O_y Films
- Enhancement of Flux-Pinning in Epitaxial Sm_Ba_Cu_3O_y Films by Introduction of Low-T_c Nanoparticles
- High-Critical-Current-Density SmBa_2Cu_3O_ Films Induced by Surface Nanoparticle
- Hetero-Epitaxial Growth of CeO_2 Films on MgO Substrates
- Critical Current Control in YBa_2Cu_3O_ Films Using Artificial Pinning Centers
- Anisotropy and Lorentz-Force Dependences of Critical Current Density in C-Axis-Oriented YBa_2Cu_3O_ Thin Film
- Enhancement of Critical Current Density in ErBa_2Cu_3O_y Thin Films by Post-Annealing
- Evaluation of Multilayer Structure and Depth Profile by PAS Using a Transparent Transducer : Photoacoustic Spectroscopy
- Evaluation of Ion Implantation into Silicon Photoacoustic Spectroscopy using Transparent Transducer Method : Photoacoustic Spectroscopy
- Improving High-κ Gate Dielectric Properties by High-Pressure Water Vapor Annealing
- Thickness Dependence of Material Properties of Epitaxial Pb(Zr_xTi_)O_3 Films on Ir/(100) (ZrO_2)_(Y_2O_3)_x(100)Si Structures
- New Series of Nickel-Based Pnictide Oxide Superconductors (Ni_2Pn_2)(Sr_4Sc_2O_6) (Pn = P, As)
- Dramatic Change in Magnetization Behaviors of La_Sr_Mn_2O_ by Control of Excess Oxygen
- Thermoelectric Performance of Magnetically c-Axis Aligned Ca-based Cobaltites
- Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
- Metalorganic Chemical Vapor Deposition of HfO_2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen
- Effect of Nitrogen on Electrical and Physical Properties of Polyatomic Layer Chemical Vapor Deposition HfSi_xO_y Gate Dielectrics
- Atomic-scale Characterization and Control of the HfO_2/Si(001) Interface