Hayashi Shigenori | Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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概要
- 同名の論文著者
- Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporationの論文著者
関連著者
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Hayashi Shinji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
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Hayashi Shigenori
Faculty Of Engineering Osaka University
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Hayashi S
Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University
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Hayashi Shigenori
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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HAYASHI Shigenori
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Hayashi Shigenori
Central Research Laboratories Matsushita Electric Ind. Co.
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Hayashi S
Saga Univ. Saga Jpn
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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Hirao T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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KOMATSU Hiroshi
Institute for Materials Research, Tohoku University
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Komatsu H
Tohoku Univ. Sendai Jpn
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Komatsu Hiroshi
Institute For Materials Research Tohoku University
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KAMADA Takeshi
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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KITAGAWA Masatoshi
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Hirao T
Research Institute For Nano-devices Kochi University Of Technology
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Kamada Takeshi
Central Research Laboratories Matsushita Electric Industrial Co. Lid.
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Inoue Takahito
Electrotechnical Laboratory
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Kitagawa M
Matsushita Electric Ind. Co. Moriguchi Jpn
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Kitagawa M
Matsushita Electric Industrial Co.
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Kitagawa M
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kitagawa Masatoshi
Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.
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Kitagawa Masatoshi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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INOUE Tetsuo
Institute for Materials Research,Tohoku University
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Yamasaki Satoshi
Joint Research Center For Atom Technology-national Institute For Advanced Interdisciplinary Research
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Hirao Takashi
Department Of Electrical Engineering Osaka University
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Yamasaki S
National Inst. Advanced Interdisciplinary Res. Tsukuba Jpn
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Hayashi Shigenobu
National Institute Of Materials And Chemical Research
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MATSUDA Akihisa
Electrotechnical Laboratory
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Yamasaki S
Nec Corp. Kanagawa Jpn
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YAMASAKI Shuichi
Superconducting Sensor Laboratory
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KANNO Isaku
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Yamasaki S
Joint Res. Center For Atom Technol. (jrcat) Tsukuba Jpn
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Kanno I
Matsushita Electric Ind. Co. Ltd. Kyoto Jpn
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Inoue T
Tohoku Univ. Sendai Jpn
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Inoue Tatsuya
Materials And Components Research Laboratory Components And Devices Research Center Matsushita Elect
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Inoue Tetsushi
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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YOSHINO Katsumi
Faculty of Engineering, Osaka University
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Yoshino Katsumi
Faculty Of Engineering Osaka University
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HAYAMIZU Kikuko
National Institute of Materials and Chemical Research
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YAMASAKI Satoshi
Electrotechnical Laboratory
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HAYASHI Shigenori
Faculty of Engineering, Osaka University
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Hasezaki Kazuhiro
Mitsubishi Heavy Industries Ltd.
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Matsushima Tomoaki
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kubota M
Opto-electronics Laboratories Oki Electric Industry Co. Ltd.
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Mitsuyu T
Hirao Active Glass Project Erato Japan Science And Technology Corporation
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Mitsuyu Tsuneo
Central Research Laboratories Matsushita Electric Ind. Co. Lid.
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TSUJIMURA Ayumu
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Tsujimura Ayumu
Advanced Technology Research Laboratories Matsushita Electric Ind.co. Ltd.
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藤井 稔
神戸大院工
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FUJII Minoru
Department of Electrical and Electronics Engineering, Faculty of Engineering, Kobe University
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INUISHI Yoshio
Faculty of Engineering, Osaka University
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Fujii Masatoshi
Department Of Chemistry Graduate School Of Science Tokyo Metropolitan University
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YAMANAKA Michinari
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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Yamamoto K
Univ. Of Tsukuba
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Takayama Ryoichi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Takayama Ryoichi
Human Environment Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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Kume T
Aoyama Gakuin Univ. Tokyo Jpn
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Inuishi Yoshio
Faculty Of Engineering Osaka University
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NANBA Takao
Department of Physics and Graduate School of Science and Technology, Kobe University
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TAKAYAMA Ryoichi
Central Research Laboratories, Matsushita, Electric Industrial Co., Ltd.
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KOMAKI Kazuki
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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TANAKA Kazunobu
Electrotechnical Laboratory
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SUZUKI Atsushi
Electrotechnical Laboratory
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Adachi Hiroaki
Graduate School of Engineering, Osaka University
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Wang X‐l
Research Institute For Scientific Measurements Tohoku University
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Wang Xiao-lei
Department Of Physics Tohoku University
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Nanba T
Department Of Physics Tohoku University
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Suzuki A
Department Of Electrical Engineering And Electronics College Of Engineering Osaka Sangyo University
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Komaki Kazuki
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Adachi Hiroaki
Graduate School Of Science And Technology Kobe University
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Ikezawa M
Tohoku Univ. Sendai
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Ikezawa Mikihiko
Department Of Physics The Faculty Of Science Tohoku University
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Ikezawa Mikihiko
Research Institute For Scientific Measurements Tokyo University
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Ikezawa Mikihiko
Department Of Physics Faculity Of Science Tohoku University
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Adachi Hideo
Applied Research Department Corporate Research Division Olympus Optical Co. Ltd.
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TOMITA Satoshi
Graduate School of Science and Technology, Kobe University
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MAMEZAKI Osamu
Graduate School of Science and Technology, Kobe University
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MASHIMA Satoshi
Electrotechnical Laboratory
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MCELHENY Peter
Electrotechnical Laboratory
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Adachi Hisanori
Department Of Polymer Science And Engineering Kyoto Institute Of Technology
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Iijima Kenji
Research Institute For Production Development
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Iijima Kenji
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Iijima Kenji
Environmental Technology Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Suzuki Atsushi
Biodevelopment Division Central Institute Nagoya Seiraku Co. Ltd.
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Suzuki Atsushi
Department Of Applied Biological Chemistry Faculty Of Agriculture University Of Niigata
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Suzuki Atsushi
Synthetic Crystal Research Laboratory Faculty Of Engineering Nagoya University
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Suzuki Atsushi
Department Of Pathology Obstetrics And Gynecology Keio University School Of Medicine
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Suzuki Atsushi
Department Of Physics School Of Science And Engineering Waseda University
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Suzuki Atsushi
Basic Research Department Prima Meat Packers Co. Ltd.
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Suzuki Atsushi
Department Of Applied Biochemistry Faculty Of Agriculture University Of Niigata
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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Shibutani Kazuyuki
Institute Of Materials Science University Of Tsukuba
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Shibutani Kazuyuki
Superconducting And Cryogenic Technology Center Kobe Steel Ltd.
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Shibutani Kazuyuki
Superconducting And Cryogenic Technology Section Technical Development Group Kobe Steel Ltd.
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Suzuki A
Department Of Obstetrics And Gynecology Keio University School Of Medicine
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NAKAGAWA Hideo
Association of Super-Advanced Electronics Technologies (ASET)
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Adachi H
Department Of Polymer Science And Engineering Kyoto Institute Of Technology
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Komaki K
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Ogura M
Jst‐crest Ibaraki Jpn
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Mamezaki Osamu
Graduate School Of Science And Technology Kobe University
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Mcelheny P
Electrotechnical Laboratory
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Nakagawa Hideo
Association Of Super-advanced Electronics Technologies(aset)
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Ogura Masahiko
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Adachi Hiroaki
Graduate School Of Engineering Osaka University:sosho Inc.:crest Jst
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Ishii Gaku
Faculty of Engineering, Osaka University
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Ishii G
Osaka Univ.
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Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
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HAYASHI Shigeo
Department of Applied Physics and Chemistry, University of Electro-Communications
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KAWAI Tomoji
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto Keiichi
Department Of Electronics Faculty Of Engineering Kobe University
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SAKAKIMA Hiroshi
Central Research Laboratories, Matsushita, Electric Industrial Co., Ltd.
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DEGUCHI Takashi
Air Conditioning Research Laboratory, Matsushita Electric Industrial Co., Ltd.
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TAKAYAMA Ryoichi
Materials and Components Research Laboratory, Matsushita Electric Industrial Co., Ltd.
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SHIBUYA Munehiro
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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NISHITSUJI Mitsuru
Semiconductor Research Center, Matsushita Electric Industrial Co, Ltd.
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TAMURA Akiyoshi
Semiconductor Research Center, Matsushita Electric Industrial Co, Ltd.
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WASA Kiyotaka
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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向田 昌志
山形大学工学部電気電子工学科
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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Suzuki Y
Hitachi Ltd. Tokyo Jpn
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Wasa K
Res. Inst. Innovative Technol. Earth Kyoto Jpn
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Wasa Kiyotaka
Research Institute Of Innovative Technology For The Earth
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Koike Yoji
Institute For Materials Research Tohoku Universisty
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Koike Yoji
Institute For Materials Research Tohoku University
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Mori K
Saga Univ. Saga Jpn
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Mukaida Masashi
Kyushu Univ. Fukuoka Jpn
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Fukase Tetsuo
Institute For Materials Research Tohoku University
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Amano Teruhiko
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
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Shibuya Masato
Optical Division Nikon Corporation
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NAKASHIMA Shin-ichi
Department of Applied Physics,Osaka University
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Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
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Shinohara Masanori
NTT Atsugi Electrical Communication Laboratories
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Hasegawa Noboru
Department Of Health And Nutrition Faculty Of Home Economics Gifu Women's University
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Hasegawa Noboru
Department Of Applied Physics Faculty Of Engineering Osaka University
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EGI Toshio
Superconductivity Research Laboratory, ISTEC
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Matsunaka Toshiyuki
Department Of Physics & Electronics Osaka Prefecture University
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Aoi Nobuo
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Moriya Tadashi
Tokyo Metropolitan Univ.
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Inuishi Yoshio
奈良工業高等専門学校
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KIM San
Faculty of Engineering, Osaka University
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YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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SHIRAFUJI Junji
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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KAWAI Shichio
The Institute of Scientific and Industrial Research, Osaka University
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HANGYO Masanori
Department of Applied Physics, Faculty of Engineering, Osaka University
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INUISHI Yoshio
Professor Emeritus, Osaka University
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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SHIMIZU Saburo
ULVAC JAPAN, Ltd
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Niwa M
Matsushita Electronics Corp. Kyoto Jpn
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Kawai S
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Kawai Shichio
The Institute Of Scientific And Industrial Research Osaka University
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MIYASHITA Satoru
Institute for Materials Research, Tohoku University
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Ishii Takao
Ntt System Electronics Laboratories
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Kawai Tomoji
The Institute Of Science And Industrial Research (isir-sanken) Osaka University
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Moriya T
Institute Of Material Science University Of Tsukuba
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YAMASAKI Satoshi
National Institute for Advanced Interdisciplinary Research
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TERAUCHI Masaharu
Faculty of Engineering, Osaka University
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NIWA Masaaki
ULSI Process Technology Development Center, Matsushita Electronics Corp.
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TSUBATA Mitsuru
Nagoya University
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Narusawa Tadashi
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
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Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Sakakima Hiroshi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Watanabe Yasutaka
Faculty Of Science Kwansei Gakuin University
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Watanabe Yasutaka
Faculty Of Engineering Osaka University
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Hayashi Shigenori
Faculty Of Engineering Osaka University:central Research Laboratories Matsushita Electric Industrial
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Matsuyama Tetsuya
Department Of Physics And Electronics Faculty Of Engineering Osaka Prefecture University
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Ikemoto Tetsuya
徳島大学医学部
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Moriya Tsuyoshi
Institute Of Material Science University Of Tsukuba
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Tawada Masafumi
Department Of Physics Nagoya University:(present Address)kek National Laboratory For High Energy Phy
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MITSUYU Tsuneo
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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HORII Sadayoshi
Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.
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Deguchi Takashi
Air Conditioning Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Karasawa T
Inst. Space And Astronautical Sci. Sagamihara Jpn
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Karasawa T
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Fukase Tetsuo
Institute For Material Research Tohoku University
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Mori K
Department Of Radiological Sciences Ibaraki Prefectural University Of Health Sciences
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NISHITSUJI Mitsuru
Electronics Research Laboratory, Matsushita Electronics Corporation
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Kim San
Faculty Of Engineering Osaka University
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Egi T
Istec Tokyo Jpn
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Egi Toshio
Superconductivity Research Laboratory International Superconductivity Technology Center (istec)
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Niwa M
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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Niwa M
Department Of Materials Science And Engineering Tokyo Denki University
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Niwa Masaaki
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Miya Hironobu
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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Miya Hironobu
Semiconductor Equipment Division Hitachi Kokusai Electric Inc.
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Wasa Kiyotaka
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Miyashita Satoru
Institute For Materials Research Tohoku University
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Inuishi Yoshio
Professor Emeritus Osaka University
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Shimizu S
R&d Association Of Future Electron Devices C/o National Institute Of Advanced Industrial Science
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Shimizu Saburo
Ulvac Corporation
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Okube Jiro
Radiation Division, Sumitomo Electric Industries Ltd.
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Moriya Tomoyoshi
Radiation Division, Sumitomo Electric Industries Ltd.
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Okube Jiro
Radiation Division Sumitomo Electric Industries Ltd.
著作論文
- Low-Temperature Preparation of Pb(Zr,Ti)O_3 Thin Filmson (Pb,La)TiO_3 Buffer Layer by Multi-Jon-Beam Sputtering
- Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
- Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
- Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
- Characterization of Pb(Zr, Ti)O_3 Thin Films Prepared by Multi-Ion-Beam Sputtering
- Substrate Potential Effects on Low-Temperature Preparation of SrTiO_3 Thin Films by RF Magnetron Sputtering
- Ferroelectric PbTiO_3 Thin Films Prepared by Multi-Ion-Beam Sputter and Ion-Assisted Deposition
- Ni_Co_x-C Nanogranular Thin Films Prepared by a Co-S puttering Method:Improvement in Magnetic Properties by Optimizing the Alloy Ratio : Magnetism
- Internal Photoemission from Ag Nanoparticles Embedded in Al_2O_3 Film : Surfaces, Interfaces, and Films
- Thin Films of Carbon Nanocapsules and Onion-Like Graphitic Particles Prepared by the Cosputtering Method
- Substrate Temperature Dependence of Deuteron Bonding States in Deuterated Amorphous Silicon Studied by ^2H Nuclear Magnetic Resonance
- ^1H Nuclear Magnetic Resonance Study of Hydrogen Distribution in Partially Deuterated Hydrogenated Amorphous Silicon
- ^P Nuclear Magnetic Resonance Study of Local Bonding Configuration of Phosphorus in Amorphous Silicon-Hydrogen-Phosphorus Alloys
- Silicon-29 Nuclear Magnetic Resonance Study of Amorphous-Microcrystalline Mixed-Phase Hydrogenated Silicon
- ^1H Nuclear Magnetic Resonance Study of Hydrogenated Amorphous Silicon Deposited from a Xe-diluted Silane Plasma
- Dielectric Breakdown of Polyacetylene
- Preparation of PbTiO_3 Thin Films by Ion- and Photoassisted Evaporation
- Preparation and Characterization of Pb-Based Ferroelectric Thin Films : Thin Films
- Electrical Transport and Electron Spin Resonance in Electron-Beam-Irradiated Polyacetylene in the Presence of SF_6 Gas
- Compound-Source Molecular Beam Epitaxy for ZnCdSe/ZnSSe/ZnMgSSe Laser Structure
- Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
- Enhancement of Electrical Conductivity of Polyacetylene by Electron Beam Irradiation in the Presence of Dopant
- Photoluminescence of Polyacetylene in Near Infrared
- Optical Absorption of Yba_2Cu_3O_ and ErBa_2Cu_3O_ Crystals due to Interband Transition : Electrical Properties of Condensed Matter
- Optical Reflectivity of Single Crystals of YBa_2Cu_3O_ and ErBa_2Cu_3O_
- Terminating Structure of Plasma-Assisted Molecular Beam Epitaxial GaN{0001} Film Surface Identified by Coaxial Impact Collision Ion Scattering Spectroscopy
- Identification of Surface Atoms of LiGaO_2(001) Substrate for Hexagonal GaN Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Superconducting Bi_2Sr_2CaCu_2O_ Single Films Grown on SrTiO_3 Substrate by the Liquid Phase Epitaxial Method
- Preparation of Single Crystals Containing the High-T_c (above 100 K) Phase of a Bi-Sr-Ca-Cu-O Superconductor
- Synthesis and Decomposition of the High-T_c Phase of a Pb-Doped Bi-Sr-Ca-Cu-O Superconductor
- A New Method for Improving the Superconducting Transition Temperature of Platy ErBa_2Cu_3O_ Single Crystals
- Growth of YBa_2Cu_3O_ Single Crystals from the High Temperature Solution
- Growth of (La_Sr_x)_2CuO_ Crystals from High Temperature Solution
- Optimization of Single Crystal Preparation of Bi_2Sr_2CaCu_2O_x Superconductor by the Travelling Solvent Floating Zone Method
- Contact Hole Etch Scaling toward 0.1 μm
- Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching
- Characterization of GdBa_2Cu_3O_ Thin Films by Raman Scattering
- Investigation of Heat-Treating Conditions for Silver-Sheathed Bi2212 Superconducting Coils
- Highly Selective SiO2 Etching Using Inductively Coupled Plasma Source with a Multispiral Coil
- Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
- Enharncement of Photoelectric Conversion Efficiency in Copper Phthalocyanine Solar Cell by Surface Plasmon Excitation
- ZnSe-Based Diode Lasers with Stripe-Geometry Fabricated by Ion Bombardment
- Cavity Parameters of ZnCdSe/ZnSe Single-Quantum-Well Separate-Confinement-Heterostructure Laser Diodes
- Zn_Cd_xSe(X=0.2-0.3)Single-Quantum-Well Laser Diodes without GaAs Buffer Layers
- A New Method of Surface Plasmon Excitation Mediated by Metallic Nanoparticles
- Enhancement of Photoelectric Conversion Efficiency in Copper Phthalocyanine Solar Cell: White Light Excitation of Surface Plasmon Polaritons
- Effects of External Modulation Signals on the Tracking of Resonance and Antiresonance of Piezoelectric Resonators
- Novel Ferroelectric Liquid Crystals with Very Large Spontaneous Polarization
- Ferroelectric Liquid Crystal Mixtures Doped with Compounds Having Chiral Groups at Both Ends of the Core