Hirao Takashi | Department Of Electrical Engineering Osaka University

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概要

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著作論文

Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
Low-Temperature Synthesis of Aligned Carbon Nanofibers on Glass Substrates by Inductively Coupled Plasma Chemical Vapor Deposition
Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias
Intense Green Cathodoluminescence from Low-Temperature-Deposited ZnO Film with Fluted Hexagonal Cone Nanostructures
SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering
Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering
Density Control of Carbon Nanotubes through the Thickness of Fe/Al Multilayer Catalyst
Formation of Nanoscale Diamond Particles without Substrate Heating by Cathodic Arc Deposition
Correlation between Field Electron Emission and Structural Properties in Randomly and Vertically Oriented Carbon Nanotube Films
Ultra-Low-Threshold Field Electron Emission from Pillar Array of Aligned Carbon Nanotube Bundles
Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition : Surfaces, Interfaces, and Films
Development of New Apparatus for Field Emission Measurement
Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
Electrical Properties of Boron-Implanted Homoepitaxial Diamond Films
Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition
Synthesis of β-SiC Layer in Silicon by Carbon Ion 'Hot' Implantation
Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
Characterization of Pb(Zr, Ti)O_3 Thin Films Prepared by Multi-Ion-Beam Sputtering
Substrate Potential Effects on Low-Temperature Preparation of SrTiO_3 Thin Films by RF Magnetron Sputtering
Scanning Tunneling Microscopy Study of the c(4X4) Structure Formation in the Sub-Monolayer Sb/Si(100) System : Surfaces, Interfaces, and Films
Mg/Si(100) Reconstructions Studied by Scanning Tunneling Microscopy
High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
Silver-Induced 3 × 3 Phase on 6H-SiC(0001)√ × √ Surface
Direct Observation of Strained Layer Formation at the Initial Stage of In Thin Film Growth on Si(100)
Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
Frequency Control Method of Magnetostatic Wave Oscillators Using External pin Diode Circuits
Simulation of Magnetostatic Wave Envelope Soliton Propagation in Yttrium Iron Garnet Films
(100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

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