Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
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概要
著者
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hirao Takashi
Department Of Electrical Engineering Osaka University
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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Matsuda Tokiyoshi
Research Institute Kochi University Of Technology
関連論文
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