β-SiC Formation by Low-Energy Ion-Doping Technique

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-08-20

著者

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Hiramatsu Takahiro

  Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850

• Hirao T

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• DEGUCHI Masahiro

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• KITAGAWA Masatoshi

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• YOSHIDA Akihisa

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• Hirao T

  Research Institute For Nano-devices Kochi University Of Technology

• Kitagawa M

  Matsushita Electric Ind. Co. Moriguchi Jpn

• Kitagawa M

  Matsushita Electric Industrial Co.

• Kitagawa M

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Kitagawa Masatoshi

  Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.

• Kitagawa Masatoshi

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

• Yoshida A

  Toyohashi Univ. Technol. Toyohashi Jpn

• Deguchi Masahiro

  Central Research Laboratories Matsushita Electric Industrial Co. Lid.

• Yoshida Akihisa

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

関連論文

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