Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field : Techniques, Instrumentations and Measurement
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-07-20
著者
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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Hirao T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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KITAGAWA Masatoshi
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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SETSUNE Kentaro
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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YOSHIDA Akihisa
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Kitagawa M
Matsushita Electric Ind. Co. Moriguchi Jpn
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Kitagawa M
Matsushita Electric Industrial Co.
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Kitagawa M
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kitagawa Masatoshi
Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.
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Kitagawa Masatoshi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Setsune Kentaro
The Central Research Laboratories Matsushita Electric Industries Co. Ltd.
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Yoshida A
Toyohashi Univ. Technol. Toyohashi Jpn
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Setsune Kentaro
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Yoshida Akihisa
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Hirao Takashi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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