YOSHIDA Akihisa | Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
スポンサーリンク
概要
関連著者
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YOSHIDA Akihisa
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Kitagawa M
Matsushita Electric Ind. Co. Moriguchi Jpn
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Kitagawa M
Matsushita Electric Industrial Co.
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Kitagawa M
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kitagawa Masatoshi
Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.
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Yoshida A
Toyohashi Univ. Technol. Toyohashi Jpn
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Yoshida Akihisa
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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Hirao T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
著作論文
- Formation of n^+ a-Si:H Thin Layer by Ion-Doping Technique
- β-SiC Formation by Low-Energy Ion-Doping Technique
- Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge : Techniques, Instrumentations and Measurement
- Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field : Techniques, Instrumentations and Measurement
- Low-Temperature and High-Rate Deposition of SrTiO_3 Thin Films by RF Magnetron Sputtering