Structure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-12-30

著者

• KAMADA Takeshi

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• KITAGAWA Masatoshi

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• SHIBUYA Munehiro

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• Shibuya Masato

  Optical Division Nikon Corporation

• Kamada T

  Matsushita Electric Ind. Co. Ltd. Kyoto Jpn

• Kamada Takeshi

  Central Research Laboratories Matsushita Electric Industrial Co. Lid.

• Kitagawa M

  Matsushita Electric Ind. Co. Moriguchi Jpn

• Kitagawa M

  Matsushita Electric Industrial Co.

• Kitagawa M

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Kitagawa Masatoshi

  Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.

• Kitagawa Masatoshi

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

• SHIBUYA Takashi

  Central Research Laboratories, Matsushita Electric Industrial Co., Lid.

• Shibuya Munehiro

  Optical Division Nikon Corporation

• Shibuya Takashi

  Central Research Laboratories Matsushita Electric Industrial Co. Lid.

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