Performance of Resolutioru Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-12-30

著者

• Shibuya Masato

  Optical Division Nikon Corporation

• Ozawa Toshihiko

  Optical Division Nikon Corporation

• KOMATSU Masaya

  Optical Division, Nikon Corporation

• OOKI Hiroshi

  Optical Division, Nikon Corporation

• Shibuya Munehiro

  Optical Division Nikon Corporation

• Komatsu M

  Meisei Univ. Tokyo Jpn

• Ooki H

  Nikon Corp. Tokyo Jpn

• Ooki Hiroshi

  Optical Division Nikon Corporation

• Shibuya Masato

  Optical Designing Headquarters Nikon Corporation

関連論文

• Substrate Potential Effects on Low-Temperature Preparation of SrTiO_3 Thin Films by RF Magnetron Sputtering
• Performance of Resolutioru Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist
• A Novel Super-Resolution Technique for Optical Lithography : Nonlinear Multiple Exposure Method
• Structure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method
• Laser Scanning Mode Interference Contrast Microscope and Its Application to Step Height Measurement
• A Novel Super Resolution Technique for High-Density Optical Data Storage using Mode Interference in Channel Waveguides
• Crosstalk-Free Condition for Land/Groove Recording of Optical Discs
• Resolution Enhancement Techniques for Optical Lithography and Optical Imaging Theory
• The Analytical Evaluation of Projection Optical Lithography

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