Improvement of Properties of SrTiO_3 Thin Films Deposited at Low Temperature and High Rate by Sputtering Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-06-15
著者
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澤田 嗣郎
東京大学
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Tsuda Shinya
New Materials Research Center Sanyo Electric Co . Ltd.
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Tsuda Shinya
Sanyo Electric Co. Ltd.
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Kohara Naoki
Advanced Technology Research Laboratories Matsushita Electric Ind. Co. Ltd.
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澤田 嗣郎
東大院工
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沢田 嗣郎
東京大学大学院工学系研究科
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澤田 嗣郎
Univ. Tokyo Tokyo Jpn
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Kitagawa M
Matsushita Electric Ind. Co. Moriguchi Jpn
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Kitagawa M
Matsushita Electric Industrial Co.
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Kitagawa M
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kitagawa Masatoshi
Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.
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Tsuda Shinya
R&d Headquarters Sanyo Electric Co. Ltd.
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Saitoh T
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Saitoh T
Ntt Basic Research Laboratories Physical Science Laboratory
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Saitoh T
Semiconductor Device Group Advanced Devices Development Center Matsushita Electric Industrial Co. Lt
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Yoshida A
Toyohashi Univ. Technol. Toyohashi Jpn
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YOSHIDA Akihisa
Advanced Technology Research Laboratories, Matsushita Electric Ind. Co. , Ltd.
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SAWADA Taisuke
Electronic Circuit Capacitor Division, Matsushita Electric Ind. Co. , Ltd.
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Tsuge Sadaji
Functional Materials Research Center Sanyo Electric Co. Ltd.
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