Effect of Heating SiH_4 on the Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Silicon (<Special Issue> Plasma Processing)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-30
著者
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TSUDA Shinya
New Materials Research Center, Sanyo Electric Co., Ltd.
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Tsuda Shinya
New Materials Research Center Sanyo Electric Co . Ltd.
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Tsuda Shinya
Sanyo Electric Co. Ltd.
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Tsuda Shinya
R&d Headquarters Sanyo Electric Co. Ltd.
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Tsuda Shinya
New Materials R. C. Sanyo Electric Co. Ltd.
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HISHIKAWA Yoshihiro
New Materials Research Center, Sanyo Electric Co., Ltd.
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SASAKI Manabu
New Materials Research Center, Sanyo Electric Co., Ltd.
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TSUGE Sadaji
New Materials Research Center, Sanyo Electric Co., Ltd.
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Sasaki M
Industrial Res. Center Of Shiga Prefecture Shiga
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Tsuda S
National Agricultural Research Center
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Hishikawa Y
New Materials Research Center Sanyo Electric Co. Ltd.
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Hishikawa Yoshihiro
New Materials Research Center Sanyo Electric Co. Ltd.
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Sasaki M
Dow Corning Toray Silicone Co. Ltd. Chiba Jpn
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