Low Temperature Fabrication of ZrN Thin Film using an Ion Beam and Application to a VCR Cylinder
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概要
- 論文の詳細を見る
- 1996-06-30
著者
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TSUDA Shinya
New Materials Research Center, Sanyo Electric Co., Ltd.
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Tsuda Shinya
New Materials R. C. Sanyo Electric Co. Ltd.
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KIYAMA Seiichi
New Materials Research Center, Sanyo Electric Co,. Ltd.
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Kiyama Seiichi
New Materials R. C. Sanyo Electric Co. Ltd.
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HIRANO Hitoshi
New Materials R. C., Sanyo Electric Co., Ltd.
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KURAMOTO Keiichi
New Materials R. C., Sanyo Electric Co., Ltd.
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DOMOTO Yoichi
New Materials R. C., Sanyo Electric Co., Ltd.
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Domoto Yoichi
New Materials R. C. Sanyo Electric Co. Ltd.
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Hirano Hitoshi
New Materials R. C. Sanyo Electric Co. Ltd.
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Kuramoto Keiichi
New Materials R. C. Sanyo Electric Co. Ltd.
関連論文
- Effect of Composition on the Properties of Amorphous Silicon Carbide at a Certain Optical Gap
- Optimization of a-SiGe:H Alloy Composition for Stable Solar Cells
- Low-Hydrogen-Content, Stable Amorphous Silicon Thin Films Prepared by Ion-Assisted Method
- Effect of the i-Layer Optical Gap on the Light-Induced Degradation of a-SiGe Solar Cells
- Investigation of Hydrogenated Amorphous Silicon Germanium Fabricated under High Hydrogen Dilution and Low Deposition Temperature Conditions for Stable Solar Cells
- Influence of Oxygen and Nitrogen in the Intrinsic Layer of a-Si:H Solar Cells
- A Photon Energy Supply for Micromachines -Development of a High-Voltage Photovoltaic Micro-Device-
- Development of Stable a-Si Solar Cells with Wide-Gap a-Si:H i-layers Deposited by an Inert Gas Plasma Treatment Method
- Preparation of Poly-Ge Considering its Application to a-Si/Poly-Ge Multilayer Structures by a Low-Temperature Solid Phase Crystallization Method
- Improvement in a-Si:H Properties by Inert Gas Plasma Treatment
- Practical Simulation of the I-V Curve for Amorphous-Silicon-Based Multijunction Solar Cells after Light Soaking
- New Interpretation of the Effect of Hydrogen Dilution of Silane on Glow-Discharged Hydrogenated Amorphous Silicon for Stable Solar Cells
- Effect of Heating SiH_4 on the Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Silicon ( Plasma Processing)
- Low Temperature Fabrication of ZrN Thin Film using an Ion Beam and Application to a VCR Cylinder
- Development of High Voltage Photovoltaic Micro-Devices for Driving Micro Actuators (Special Issue on Micromachine Technology)
- Preparation of Poly-Ge Considering its Application to a-Si/Poly-Ge Multilayer Structures by a Low-Temperature Solid Phase Crystallization Method
- Considering the Dependence of the Light-Induced Effect on Carbon Content in Boron-Doped Amorphous Silicon-Carbon