Sasaki M | Industrial Res. Center Of Shiga Prefecture Shiga

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著作論文

Low-Temperature Synthesis of C-Axis-Oriented Polycrystalline Aluminum Nitride Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using AlBr_3-N_2-H_2-Ar Gas System
Preparation of AlN-Al_2O_3 Composite Films by Microwave Plasma Chemical Vapor Deposition
Effect of Ar Gas Addition on AlN Film Formation by Microwave Plasma Chemical Vapor Deposition
Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD
Effect of Heating SiH_4 on the Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Silicon ( Plasma Processing)
High-Quality Wide-Gap Hydrogenated Amorphous Silicon Fabricated Using Hydrogen Plasma Post-Treatment
Dependence of ECR Plasma Etching Characteristics on Sub Magnetic Field and Substrate Position
Effects of Pixel Electrode Structure on Image Lag of STACK-CCD Image Sensor
Hg-Sensitized Photochemical Vapor Depositiorn Application to Hydrogenated Amorphous Silicon Photoconversion Layer Overlaid on Charge Coupled Device
Trimethylgallium Reactions on As-Stabilized and Ga-Stabilized GaAs(100) Surfaces
KrF Excimer Laser Irradiation Effect on GaAs Atomic Layer Epitaxy
GaAs Atomic Layer Epitaxy Using the KrF Excimer Laser
UV Absorption Spectra of Adlayers of Trimethylgallium and Arsine

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