Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-02-20
著者
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HIRAI Toshio
Institute for Materials Research, Tohoku University
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Hirai T
Tohoku Univ. Sendai‐shi
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Hirai Toshio
Institute For Materals Research Tohoku University
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SOMENO Yoshihiro
Alps Electric Co. Ltd.
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SASAKI Makoto
Institute for Materials Research, Tohoku University
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Hirai Toshihiro
Material Development Research Laboratory Nippon Mining Co. Lid.
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Sasaki M
Industrial Res. Center Of Shiga Prefecture Shiga
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Sasaki M
Hokkaido Univ. Sapporo
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SOMENO Yoshihiro
Mechatronic Devices Division I, ALPS Electric Co. Ltd.
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Someno Yoshihiro
Mechatronic Devices Division I Alps Electric Co. Ltd.
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Sasaki Makoto
Institute For Materials Research Tohoku University
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Sasaki Makoto
Institute For Cosmic Ray Research University Of Tokyo
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