Crystal and Electrical Characterizations of Epitaxial Ce_XZr_<1-X>O_2 Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field Effect Transistor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-09-30
著者
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Koike H
Nec Corp. Kanagawa Jpn
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Kishi H
General R&d Laboratories Taiyo Yuden Co. Ltd.
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Hirai T
Tohoku Univ. Sendai‐shi
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Hirai Toshihiro
Material Development Research Laboratory Nippon Mining Co. Lid.
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Kishi Hiroshi
General R&d Laboratories Toiyo Yuden Co. Ltd.
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Kishi Hiroshi
The School Of Science And Engineering Waseda University
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Tarui Yasuo
The School of Science and Engineering, Waseda University
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Tarui Y
National Institute Of Advanced Industrial Science And Technology
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Koike H
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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Hirai T
Canon Inc. Tokyo Jpn
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TARUI Yasuo
National Institute of Advanced Industrial science and Technology
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HIRAI Tadahiko
LSI Laboratories, Asahi Chemical Industry Co., Ltd.
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NAGASHIMA Kazuhito
The School of Science and Engineering, Waseda University
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KOIKE Hiroshi
The School of Science and Engineering, Waseda University
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MATSUNO Shinya
Analytical Research Center, Asahi Chemical Industry Co., Ltd.
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KOISE Hiroshi
The School of Science and Engineering, Waseda University
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Matsuno Shinya
Analytical Research Center Asahi Chemical Industry Co. Ltd.
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Nagashima K
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Tarui Yasuo
The School Of Science And Engineering Waseda University
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