HIRAI Tadahiko | LSI Laboratories, Asahi Chemical Industry Co., Ltd.
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概要
関連著者
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HIRAI Tadahiko
LSI Laboratories, Asahi Chemical Industry Co., Ltd.
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Tarui Yasuo
The School Of Science And Engineering Waseda University
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Hirai T
Tohoku Univ. Sendai‐shi
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Hirai Toshihiro
Material Development Research Laboratory Nippon Mining Co. Lid.
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Tarui Yasuo
The School of Science and Engineering, Waseda University
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Hirai T
Canon Inc. Tokyo Jpn
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TARUI Yasuo
National Institute of Advanced Industrial science and Technology
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Tarui Y
National Institute Of Advanced Industrial Science And Technology
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KOIKE Hiroshi
The School of Science and Engineering, Waseda University
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Koike H
Nec Corp. Kanagawa Jpn
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Kishi Hiroshi
General R&d Laboratories Toiyo Yuden Co. Ltd.
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Kishi Hiroshi
The School Of Science And Engineering Waseda University
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NAGASHIMA Kazuhito
The School of Science and Engineering, Waseda University
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Teramoto Kazuhiro
The School Of Science And Engineering Waseda University
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Koike H
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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TERAMOTO Kazuhiro
The School of Science and Engineering, Waseda University
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Nagashima K
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Goto Takaaki
Department Of Electric Engineering Tokyo University Of Agriculture And Technology
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Goto Takaaki
Department Of Developmental Disorders National Institute Of Mental Health National Center Of Neurology And Psychiatry
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Shimada Toshikazu
Electronics Research Laboratory Nissan Motor Co. Ltd.
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Kishi H
General R&d Laboratories Taiyo Yuden Co. Ltd.
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MATSUNO Shinya
Analytical Research Center, Asahi Chemical Industry Co., Ltd.
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TANIMOTO Satoshi
Electronics Research Laboratory, Nissan Motor Co., Ltd.
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Shimada T
Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of
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Matsuno Shinya
Analytical Research Center Asahi Chemical Industry Co. Ltd.
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Tanimoto Satoshi
Electronics Research Laboratory Nissan Motor Co. Ltd.
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Uesugi T
Waseda Univ. Tokyo Jpn
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Kishi Hiroshi
Taiyo Yuden Co. Ltd.
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Uesugi Takumi
The School of Science and Engineering, Waseda University
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MATSUHASHI Hideki
Department of Electronic Engineering, Tokyo University of Agriculture and Technology
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FUJISAKI Yoshihide
The School of Science and Engineering, Waseda University
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KOISE Hiroshi
The School of Science and Engineering, Waseda University
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NISHI Takeharu
The School of Science and Engineering, Waseda University
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Nishi Takeharu
The School Of Science And Engineering Waseda University
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Matsuhashi Hideki
Department Of Electronic Engineering Tokyo University Of Agriculture And Technology
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Fujisaki Y
R&d Association For Future Electron Devices
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Fujisaki Yoshihisa
R&D Association for Future Electron Devices
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Koike Hiroshi
The School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169, Japan
著作論文
- Crystal and Electrical Characterizations of Oriented Yttria-Stabilized Zirconia Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field-Effect Transistor
- Preparation of Tetragonal Perovskite Single Phase PbTiO_3 Film Using an Improved Metal-Organic Chemical Vapor Deposition Method Alternately Introdueing Pb and Ti Precursors
- Influence of Ce Content on Crystal and Electrical Properties of Ce_xZr_0_2 Thin Films on Si(100) Substrates
- Initial Stage and Growth Process of Ceria, Yttria-Stabilized-Zirconia and Ceria-Zirconia Mixture Thin Films on Si(100) Surfaces
- Characteristics of Metal/Ferroelectric/Insulator/Semiconductor Structure Using SrBi_2Ta_2O_9 as the Ferroelectric Material
- Crystal and Electrical Characterizations of Epitaxial Ce_XZr_O_2 Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field Effect Transistor
- Characterization of Metal/Ferroelectric/Insulator/Semiconductor Structure with CeO_2 Buffer Layer
- Preparation of Perovskite Oriented PbZr_xTi_O_3 Films with Suppressed Vapor Phase Reactions by a Digital Chemical Vapor Deposition Method
- Formation of Metal/Ferroelectric/Insulator/Semiconductor Structure with a CeO_2 Buffer Layer ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Initial Stage and Growth Process of Ceria, Yttria-Stabilized-Zirconia and Ceria-Zirconia Mixture Thin Films on Si(100) Surfaces