Hirai T | Tohoku Univ. Sendai‐shi
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概要
関連著者
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Hirai T
Tohoku Univ. Sendai‐shi
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Hirai Toshihiro
Material Development Research Laboratory Nippon Mining Co. Lid.
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HIRAI Toshio
Institute for Materials Research, Tohoku University
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Hirai Toshio
Institute For Materals Research Tohoku University
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YAMANE Hisanori
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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Tarui Yasuo
The School of Science and Engineering, Waseda University
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Tarui Y
National Institute Of Advanced Industrial Science And Technology
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Kurosawa Hideyuki
RIKEN Co.
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Koike H
Nec Corp. Kanagawa Jpn
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Kishi Hiroshi
General R&d Laboratories Toiyo Yuden Co. Ltd.
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Kishi Hiroshi
The School Of Science And Engineering Waseda University
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Kobayashi Norio
Institute For Materials Research Tohoku University
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山根 久典
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Kuroda Noritaka
Discovery Research Laboratories V Discovery Research Division Takeda Chemical Industries Ltd.
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Kuroda Noritaka
Institute For Materials Science Tohoku University
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Yamane H
Tohoku Univ. Sendai Jpn
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YOSHIZAWA Atsushi
Nippon Mining Co., Lid, Materials Development Research Laboratories
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MASUMOTO Hiroshi
Institute for Materials Research, Tohoku University
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Yoshizawa Atsushi
Material Development Research Laboratory Nippon Mining Co. Lid.
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Yoshizawa Atsushi
Materials Development Research Laboratory Nippon Mining Co. Ltd.
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Yoshizawa Atsushi
Nippon Mining Co. Lid Materials Development Research Laboratories
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WATANABE Kazuo
Institute for Materials Research, Tohoku University
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Muto Yoshio
Institute For Materials Research Tohoku University
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WATAZAWA Keiichi
Sumitomo Heavy Industries Ltd.
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Kishi H
General R&d Laboratories Taiyo Yuden Co. Ltd.
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Muto Y
Institute For Materials Research Tohoku University
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Watanabe K
National Institute For Fusion Science
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Watanabe Kazuo
Institute For Materials Research Tohoku University
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Watanabe Kazuto
Safety Assessment Department Chugai Pharmaceutical Co. Ltd.
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GOTO Takashi
Institute for Materials Research, Tohoku University
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Awaji S
Institute For Materials Research Tohoku University
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佐藤 知矢
Department Of Physics Faculty Of Science Shinshu University
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AWAJI Satoshi
Institute for Materials Research, Tohoku University
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Baba Akira
Department Of Cardiovascular Medicine Wakayama Medical University
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Baba A
Niigata Univ. Niigata Jpn
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Awaji Satoshi
Institute For Materials Research Tohoku University
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Baba A
Hachinohe Inst. Technol. Aomori
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MASUDA Yoichiro
Department of Electrical Engineering, Faculty of Engineering, Hachinohe Institute of Technology
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Kishi Hiroshi
Taiyo Yuden Co. Ltd.
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Goto Takashi
Institute For Material Research Tohoku University
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NISHIYAMA Isa
Japan Energy Corporation
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Koike H
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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黒田 規敬
熊本大学大学院
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BABA Akira
Center for Transdisciplinary Research, Niigata University
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Yamashita Tsutomu
Department of Sensory Science, Faculty of Health Science and Technology, Kawasaki University of Medi
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IWASAKI Hideo
Institute for Materials Research (IMR), Tohoku University
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FUKUMASA Mitsuo
Materials Development Research Laboratory, Nippon Mining Co., Ltd.
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Fukumasa Mitsuo
Material Development Research Laboratories Nippon Mining Co. Ltd.
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SOMENO Yoshihiro
Alps Electric Co. Ltd.
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SASAKI Makoto
Institute for Materials Research, Tohoku University
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Hirai Tadahiko
The School of Science and Engineering, Waseda University
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Masuda Yoshitake
Nagoya University Graduate School Of Engineering Department Of Applied Chemistry
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Yamashita Tsutomu
Recearch Institute Of Electrical Communication Tohoku University
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Iwasaki Hideo
Mechanical Systems Laboratory Toshiba Corporation
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Sasaki M
Industrial Res. Center Of Shiga Prefecture Shiga
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Yamashita T
The Graduate School Of Engineering Science And The Liquid Crystal Institute Science University Of To
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Masuda Y
Department Of Electronic Intelligence And Systems Hachinohe Institute Of Technology
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Masuda Yoichiro
Department Of Electrical And Electronics Engineering Graduate School Hachinohe Institute Of Technolo
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Baba A
Center For Transdisciplinary Research Niigata University
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Baba A
Kyushu Univ.
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KAGOSHIMA Seiichi
Department of Basic Science, University of Tokyo
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宮崎 譲
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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宮崎 譲
東北大 工
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MORITA Hirofumi
NTT LSI Laboratories
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HIRAI Takashi
Department of Gastroenterological Surgery, Aichi Cancer Center Hospital
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Uesugi T
Waseda Univ. Tokyo Jpn
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Morita H
Lcd Division Toshiba Corporation
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Tasaka Masayasu
Department Of Materials Science And Engineering Graduate School Of Science And Technology Shinshu Un
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Goto Takaaki
Department Of Electric Engineering Tokyo University Of Agriculture And Technology
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KAWABE Hisashi
Tatsuta Electric Wire & Cable Co., Ltd.
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HIKAMI Shinobu
Department of Pure and Applied Sciences, University of Tokyo
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Hikami S
Univ. Tokyo Tokyo
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Hikami Shinobu
Department Of Pure And Applied Sciences University Of Tokyo
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Hikami Shinobu
Department Of Pure And Applied Sciences College Of Arts And Sciences University Of Tokyo
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Hikami Shinobu
Department Of Basic Sciences University Of Tokyo
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Hikami Shinobu
Research Institute For Fundamental Physics Kyoto University
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Kagoshima Seiichi
Institute For Protein Research Osaka University
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Kagoshima S
Department Of Basic Science University Of Tokyo
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Kagoshima Seiichi
Department Of Art And Science The University Of Tokyo
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MORITA Hirofumi
NTT Telecommunications Energy Laboratories
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Uesugi Takumi
The School of Science and Engineering, Waseda University
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HIRAI Takanori
Department of Materials Science and Engineering, Graduate School of Science and Technology, Shinshu
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MORITA Hiroshi
LCD Division, Toshiba Corporation
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YAMASHITA Tsutomu
New Industry Creation Hatchery Center, Tohoku University
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Sakaguchi K
Institute For Protein Research Osaka University
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Era Masanori
Department Of Electronics Nagaoka University Of Technology
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宮崎 譲
東北大工
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宮崎 譲
東北大学工学部応用物理学科
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Shimada Toshikazu
Electronics Research Laboratory Nissan Motor Co. Ltd.
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MATSUI Toshiaki
Communication Research Laborator
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MATSUI Tetsuyuki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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ERA Masanori
Department of Electronics, Nagaoka University of Technology
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NOGE Satoru
Department of Electronics, Nagaoka University of Technology
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Matsui Toshiaki
Communication Research Laboratory Ministry Of Posts And Telecommunications
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Noge Satoru
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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Muto Y
The Institute For Materials Research Tohoku University
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Irie A
Nagaoka Univ. Technology Niigata
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Irie A
Utsunomiya Univ. Utsunomiya‐shi Jpn
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NOGAMI Yoshio
Department of Physics, Okayama University
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藤田 茂夫
京都大学大学院工学研究科電子工学
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Zhang Wei
Institute For Materials Research Tohoku University
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HIROTSU Yoshihiko
Department of Mechanical Engineering, Nagaoka University of Technology
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久保 健
青山学院大 理工
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弘津 禎彦
大阪大学産業科学研究所高次制御材料科学研究部門材料機能物性研究分野
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FUJITA Shigetaka
Department of Electrical and Electronic System, Hachinohe Institute of Technology
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Imai Syozo
Research Institute Of Electrical Communication Tohoku University
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Nogami Y
Kyoto Univ. Kyoto
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Kubo K
Department Of Pure And Applied Sciences University Of Tokyo
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藤田 静雄
京大 国際融合創造セ
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MASUMI Taizo
Department of Pure and Applid Sciences,University of Tokyo
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SAKAI Shiro
Department of Electrical and Electronic Engineering, University of Tokushima
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Sakai S
Department Of Electrical And Electronic Engineering The University Of Tokushima
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Sakai S
Electrotechnical Lab. Ibaraki Jpn
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Sakai S
Tokushima Univ. Tokushima Jpn
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Sakai S
Department Of Electric And Computer Engineering Nagoya Institute Of Technology
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Sakai S
Department Of Electrical And Electronic Engineering The University Of Tokushinna
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Sakai S
Electrotechnical Lab. Ibaraki
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Sakai H
Meijo Univ. Nagoya Jpn
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Masumi T
National Inst. Materials Sci. Ibaraki
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Masumi Taizo
National Institute For Materials Science Nanomaterials Laboratory
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Masumi Taizo
Department Of Applied Physics University Of Tokyo
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Taino Mitsuhiko
Kek High Energy Accelerator Research Organization
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Awaji Satoshi
Tohoku Univ. Sendai Jpn
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Sakai H
Hiroshima‐denki Inst. Technol Hiroshima Jpn
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Sakai Hiroto
Department Of Quantum Engineering Nagoya University
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MINAMI Hidetoshi
Department of Pure and Applied Sciences,College of Arts and Sciences,University of Tokyo
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KOMIYAMA Susumu
Department of Basic Science, University of Tokyo
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KUBO Koichi
Department of Pure and Applied Sciences,University of Tokyo
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藤田 静雄
京都大学大学院工学研究科電子物性工学専攻所属
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Noto K
Institute For Materials Research Tohoku University
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NAGATA Kunihiro
Department of Electronic Engineering, The National Defense Academy
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KIDACHI Yuuki
Department of Electrical Engineering, Faculty of Engineering, Hachinohe Institute of Technology
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WATADZU Akira
Institute for Material Research, Tohoku University
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HIRA Toshio
Institute for Material Research, Tohoku University
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MINAKATA Makoto
Institute of Electrical Communication, Tohoku Universtiy
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MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
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Imai Syozo
Research Institute Electrical Communication Tohoku University
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Sakai S
Department Of Electrical And Electronic Engineering Tokushima University
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Sakai Shiro
Graduate School Of Engineering The University Of Tokushima
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Sakai S
Faculty Of Education Shinshu University:(present Address)department Of Materials Science And Chemica
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Nogami Y
Okayama Univ. Okayama
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Suzuki H
Solid State Division Hamamatsu Photonics K.k.
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WANG Zhen
Department of Pathology, Affiliated Tumor Hospital of Xinjiang Medical University
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Kobayashi N
Institute For Materials Research Tohoku University Katahira
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KOBATASHI Norio
Institute for Materials Research Tohoku University
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MINAGAWA Yasushi
Institute for Materials Research Tohoku University
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YAMABE Hisanori
Institute for Materials Research Tohoku University
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Hasei Masaharu
Riken Co.
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SUGAWARA Nobuhiro
Research Institute of Electrical Communication, Tohoku University
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SUMIYA Kazushige
Research Institute of Electrical Communication, Tohoku University
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ITO Kimihiko
Research Institute of Electrical Communication, Tohoku University
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SUZUKI Hajime
Riken Corporation
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MIYAGAWA Katsumi
Department of Mechanical Engineering, Nagaoka University of Technology
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IRIE Akinobu
Department of Electronics, Nagaoka University of Technology
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IRIE Akinobu
Faculty of Engineering, Nagaoka University of Technology
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ERA Masanori
Faculty of Engineering, Nagaoka University of Technology
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YAMASHITA Tsutomu
Faculty of Engineering, Nagaoka University of Technology
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KUROSAWA Hideyuki
Institute for Materials Research, Tohoku University
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HIRAI Toshio
RIKEN Co.
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Ito Kimihiko
Research Institute Of Electrical Communication Tohoku University
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Suzuki H
Meidensha Corp. Tokyo Jpn
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Suzuki Hisanori
Solid State Division Hamamatsu Photonics K.k.
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Migita Shinji
Electrotechnical Laboratoy
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Sakai Shigeki
Electrotechnical Laboratory
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SAKAMAKI Kazuo
The School of Science and Engineering, Waseda University
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Fujita Shigetaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Hachinohe Institute Of Te
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Miyagawa Katsumi
Department Of Mechanical Engineering Nagaoka University Of Technology
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Sumiya Kazushige
Research Institute Of Electrical Communication Tohoku University
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Minami Hidetoshi
Department Of Pure And Applied Sciences University Of Tokyo
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Minami Hidetoshi
Department Of Pure And Applied Sciences College Of Arts And Sciences University Of Tokyo
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Yamashita Tsutomu
New Industry Creation Hatchery Center Tohoku University
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Sugawara Nobuhiro
Research Institute Of Electrical Communication Tohoku University
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Masumi T
Univ. Tokyo Tokyo
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Hirabayashi M
Electrotechnical Laboratory
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Nogami Yoshio
Department Of Physics Graduate School Of Natural Science And Technology Okayama University
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GOTO Kenya
Department of Information and Communication Technology Tokai University
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Sato F
Equine Research Institute
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Sato F
Jasco Corp. Tokyo Jpn
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SATO Fumio
NHK Science and Technical Research Laboratories
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MARUYAMA Hirotaka
NHK Science and Technical Research Laboratories
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GOTO Katsuyuki
NHK Science and Technical Research Laboratories
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FUJIMOTO Isao
NHK Science and Technical Research Laboratories
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SHIDARA Keiichi
NHK Science and Technical Research Laboratories
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KAWAMURA Tatsurou
Electron Tube & Devices Division, Hitachi Ltd.
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HIRAI Tadaaki
Central Research Laboratory, Hitachi Ltd.
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SAKAI Hideyuki
Electron Tube & Devices Division, Hitachi Ltd.
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CHIKAWA Jun-ichi
Himeji Institute of Technology
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Maruyama H
Kyoto Univ. Kyoto Jpn
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Wang Zhen
Department Of Astronomy Nanjing University
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Goto K
Department Of Information And Communication Technology Tokai University
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Nagata K
Department Of Materials Science And Engineering The-national Defense Academy
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Narumi Kenji
Av Core Technology Development Center Matsushita Electric Industrial Co. Ltd.
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Irie Akinobu
Department Of Electrical And Electronic Engineering Faculty Of Engineering Utsunomiya University
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Migita Shinji
National Institute Of Advanced Industrial Science And Technology
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Sakai S
Sci. Univ. Tokyo Tokyo Jpn
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Chikawa J
Himeji Institute Of Technology
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Fujimoto I
Nhk Science And Technical Research Lab. Tokyo Jpn
著作論文
- Synthesis of BaTiO_3 Thin Films Substituted with Hafnium and Zirconium by a Laser Ablation Method Using the Fourth-harmonic Wave of a YAG Laser
- Optical Properties of Ba_2NaNb_5O_ Film Fabricated by RF Magnetron Sputtering Method
- Preparation of Ba_2NaNb_5O_ Film by RF Magnetron Sputtering Method
- Crystal Growth, Dielectric and Polarization Reversal Properties of Bi_4Ti_3O_ Single Crystal
- Preparation and Dielectric and Electrooptic Properties of Bi_4Ti_3O_ Films by Electron Cyclotron Resonance plasma Sputtering Deposition : Thin Films
- Characterization of the High-T_c Superconductor Y-Ba-Cu Oxide : Critical Current and Crystal Structure
- Preparation of Superconducting YBa_2Cu_3O_ Films by ECR Plasma Sputtering
- Low-Temperature Synthesis of C-Axis-Oriented Polycrystalline Aluminum Nitride Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using AlBr_3-N_2-H_2-Ar Gas System
- Preparation of AlN-Al_2O_3 Composite Films by Microwave Plasma Chemical Vapor Deposition
- Effect of Ar Gas Addition on AlN Film Formation by Microwave Plasma Chemical Vapor Deposition
- Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD
- Dimensional Crossover Effect of Pinning in YBa_2Cu_3O_7 Films
- Dimensional Crossover Effect in J_c Characteristics of Chemical Vapor Deposition Processed YBa_2Cu_3O_ Films
- Study of Resistive Superconducting Transition in YBa_2Cu_3O_7 Films(High-T_c Superconducting Materials Research)
- Critical Current Properties and Microstructures in CVD-Y_1Ba_2Cu_3O_ Films(High-T_c Superconducting Materials Research)
- Anisotropic Behavior Critical Current Density and Magnetic Relaxation in High-J_c YBa_2Cu_3O_7 Films : III-B Flux-Line Dynamics : III Oxide Superconductors, Experiments III : Superconducting State
- Low-Temperature Deposition of Y-Ba-Cu-O Superconducting Films by Thermal Chemical Vapor Deposition
- Submillimeter-Wave Response of Nb-YBaCuO Point-Contact Josephson Junctions Using YBaCuO Thin Films Prepared by CVD
- Thin Film Structure of YBa_2Cu_3O_ on (001) MgO Substrate Studied by TEM
- Josephson Current in Microbridges of YBa_2Cu_3O_ Thin Films Prepared by CVD
- YBCO DC SQUID of MOCVD Thin Film Bridge
- Bridge Type Josephson Junctions in MO-CVD Thin Films
- Critical Current Criterion in High-T_c Superconducting Films
- Preparation of Bi-Sr-Ca-Cu-O Superconducting Films by CVD
- Formation of Bismuth Strontium Calcium Copper Oxide Superconducting Films by Vapor Deposition : Electrical Properties Condensed Matter
- T_c of c-Axis-Oriented Y-Ba-Cu-O Films Prepared by CVD : Electrical Properties of Condensed Matter
- Growth Style of Bi_4Ti_3O_ Thin Films on CeO_2/Ce_Zr_O_2 Buffered Si Substrates
- Characteristics of a Metal/Ferroelectric/Insulator/Semiconductor Structure Using an Ultrathin Nitrided Oxide Film as the Buffer Layer
- Current-Voltage Characteristics and Conductivity of Metal-Insulator-Metal(Ti/TaO_x/Ta) Type Thin-Film Diode
- Current-Voltage Characteristics of Thin-Film Diode Elements and Application of Poole-Frenkel Equation
- Influence of Current-Voltage Characteristics on Image-Sticking of Thin-Film-Diode Liquid-Crystal Displays
- Characteristics of a New High-Sensitivity X-Ray Imaging Tube for Video Topography
- Crystal and Electrical Characterizations of Oriented Yttria-Stabilized Zirconia Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field-Effect Transistor
- Preparation of Tetragonal Perovskite Single Phase PbTiO_3 Film Using an Improved Metal-Organic Chemical Vapor Deposition Method Alternately Introdueing Pb and Ti Precursors
- High T_c Magnetic Superconductor : Ho-Ba-Cu Oxide
- High Transition Temperature Superconductor: Y-Ba-Cu Oxide
- Influence of Ce Content on Crystal and Electrical Properties of Ce_xZr_0_2 Thin Films on Si(100) Substrates
- Preparation of SrBi_2Ta_2O_9 Film at Low Temperatures and Fabrication of a Metal/Ferroelectric/Insulator/Semiconductor Field Effect Transistor Using Al/SrBi_2Ta_2O_9/CeO_2/Si(100) Structures
- Initial Stage and Growth Process of Ceria, Yttria-Stabilized-Zirconia and Ceria-Zirconia Mixture Thin Films on Si(100) Surfaces
- Effect of Reducing Process Temperature for Preparing SrBi_2Ta_20_9 in a Metal/Ferroelectric/ Semiconductor Structure
- Characteristics of Metal/Ferroelectric/Insulator/Semiconductor Structure Using SrBi_2Ta_2O_9 as the Ferroelectric Material
- Crystal and Electrical Characterizations of Epitaxial Ce_XZr_O_2 Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field Effect Transistor
- Characterization of Metal/Ferroelectric/Insulator/Semiconductor Structure with CeO_2 Buffer Layer
- Preparation of Perovskite Oriented PbZr_xTi_O_3 Films with Suppressed Vapor Phase Reactions by a Digital Chemical Vapor Deposition Method
- Formation of Metal/Ferroelectric/Insulator/Semiconductor Structure with a CeO_2 Buffer Layer ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Different Effects of Alkyl Chain Length on Rotational Viscosity in Two Types of FLC Mixtures
- Antiferroelectric Chiral Smectic C Materials Having a 2-Alkyl Alkanoyl Group in the Chiral Part
- Effect of Alkyl Chain Length of Chiral Dopants on Rotational Viscosity of FLC Mixtures
- New Ferroelectric Liquid Crystal with Large Spontaneous Polarization
- Effect of Core Structure on Spontaneous Polarization in New Ferroelectric Liquid Crystals with a Fluorinated Chiral Part
- ^C NMR Observation of Molecular Motions at the Smectic-A-Smectic-C (Smectic-C^*) Transition in a Recemic (Chiral) Smectic Liquid Crystal
- ^C NMR Analysis of Molecular Motions of a Ferroelectric Liquid Crystal