Taino Mitsuhiko | Kek High Energy Accelerator Research Organization

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概要

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著作論文

Study of π^+π^- Pair Production in a Two-Photon Process at TRISTAN : VENUS Collaboration
New Limits on Neutral Scalar Bosons
Measurement of the Reactions e^+e^-→e^+e^- and e^+e^-→γγ at √=52 GeV
Search for the Top Quark in e^+e^- Annihilation at √=50 GeV:The First Result from the VENUS Detector at TRISTAN
Parallel-Processing Diagnostic Program for a Transputer-Based Readout System
Simulation Study of Time-Walk Issues for Drift Tubes
Measurement of a Cross Section for the ^Al (p,3pn)^Na Reaction at 12 GeV
Relationship between Surface Roughness and Barrier Uniformity
Construction and Performance of a Large-Aperture Wire-Chamber Spectrometer for Pion Scattering Experiments at KEK
Antiproton-nucleon Annihilation into π^oM and ηM with M=η, ω, ρ, and πin Antiproton-deuterium Annihilation at Rest : Elementary Particles and Fields
Temperature Dependence of Hot-Electron-Induced Electroluminescence from Hydrogenated Amorphous Silicon
Electroluminescence and Avalanche Multiplication at Electric Field Strength Exceeding 1 MV/cm in Hydrogenated Amorphous SiC Alloy
Effect of Free Carriers on ac-Driven Electroluminescent Devices with Hydrogenated Amorphous Silicon Carbide Thin Films
Role of Carbon and Hydrogen in Reactive Ion Etching of InP by Gas Mixture of Ethane and Hydrogen
Open-Tube Zn Diffusion Method for InGaAsP/InP Heterojunction Bipolar Transistors
Josephson Current in Microbridges of YBa_2Cu_3O_ Thin Films Prepared by CVD
Damage to YBa_2Cu_3O_y Surface Caused by Ar Ion Beam Etching
Cross-Sectional Observation in (103)-Oriented YBa_2Cu_3O_x/SrTiO_3/(013)-Oriented YBa_2Cu_3O_x Tunnel Junction
Fabrication of Tunnel Junctions with YBCO/Insulator/YBCO Layered Structure Using (013)-Oriented Films as Base Layer
Detection of Fine Particles in Liquids by Laser Breakdown Method
Thermal Desorption Spectroscopy and X-Ray Photoelectron Spectroscopy Study of CF_x Layer Deposited on Si and Si0_2
Characteristics of Very High-Aspect-Ratio Contact Hole Etching
Dry-Etching Mechanism of Sputtered Pb(Zr_Ti_x)O_3 Film
0.2 μm Hole Pattern Generation by Critical Dimension Biassing Using Resin Overcoat
Fine Contact Hole Etching in Magneto-Microwave Plasma
Particle Size Dependence of Correlation between Plasma Emission Delay Time and Plasma Emission Intensity of Laser Breakdown Induced by a Particle

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