Role of Carbon and Hydrogen in Reactive Ion Etching of InP by Gas Mixture of Ethane and Hydrogen
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-10-15
著者
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Taino Mitsuhiko
Kek High Energy Accelerator Research Organization
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Ohtsuka K
Sanken Electric Co. Ltd. Niiza Jpn
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Ohtsuka Ken-ichi
Central Research Laboratory Mistubishi Electric Corporation
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Isu Toshiro
Central Research Laboratory Mitsubishi Electric Corporation
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MATSUI Tetsuyuki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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SUGIMOTO Hiroshi
Central Research Laboratory, Mitsubishi Electric Corporation
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MATSUI Teruhito
Manufacturing Development Laboratory, Mitsubishi Electric Corporation
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Matsui Toshiaki
Communication Research Laboratory Ministry Of Posts And Telecommunications
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Matsui T
Department Of Systems Innovation Graduate School Of Engineering Science Osaka University
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Sugimoto H
Kanazawa Inst. Technology Ishikawa Jpn
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Takasaki Minoru
Kek High Energy Accelerator Research Organization
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