Fine Contact Hole Etching in Magneto-Microwave Plasma

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概要

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• Characteristics of fine contact hole etching have been investigated in hydro-fluorocarbon magneto-microwave plasma focusing on the z component of the gradient of magnetic field at 0.0875 T (dB/dz) and peak-to-peak voltage of RF bias (V_<pp>) as parameters. Decrease of dB/dz drastically decreases the etch rate of boro-phospho silicate glass (BPSG), critical dimension loss (defined as diameter of the top of contact hole minus diameter of the bottom of resist) and selectivity over heavily doped n-type polycrystalline silicon (n^+ poly Si) and resist in fine contact holes. The changes of etching characteristics are correlated with neither F/C ratio nor C1s spectrum of deposited film, but with deposition rate in the region of high V_<pp>, which presumably reflects the change of incident CF_m^+ ion species with dB/dz.

• 社団法人応用物理学会の論文
• 1994-04-30

著者

• Taino Mitsuhiko

  Kek High Energy Accelerator Research Organization

• IKEGAMI Naokatsu

  VLSI R〓D Center, Oki Electric Industry Co., Ltd.

• MATSUI Tetsuyuki

  Department of Physical Science, Graduate School of Engineering Science, Osaka University

• Matsui Toshiaki

  Communication Research Laboratory Ministry Of Posts And Telecommunications

• Matsui T

  Department Of Systems Innovation Graduate School Of Engineering Science Osaka University

• Hashimoto J

  Nagasaki Univ. Nagasaki Jpn

• KANAMORI Jun

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Kanamori J

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Kanamori Jun

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Matsui Takayuki

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• MIYAKAWA Yasuhiro

  VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.

• HASHIMOTO Jun

  VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.

• Takasaki Minoru

  Kek High Energy Accelerator Research Organization

• Miyakawa Yasuhiro

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Ikegami Naokatsu

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• HASHIMOTO Jun

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

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