Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology

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SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
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Role of Oxygen in Poly-Si Etching by Cl_2/O_2 Plasmas
Role of Fluorine in Reactive Ion Etching of Silicon Dioxide
Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide : An Effect of Thermal Excitation
Mechanisms of High PSG/SiO_2 Selective Etching in a Highly Polymerized Fluorocarbon Plasma
Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology
Roles of Ions and Radicals in Silicon Oxide Etching
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Reaction Studies between Fluorocarbon Films and Si Using Temperature-Programmed X-Ray Photoelectron and Desorption Spectroscopies
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Electron Beam Induced Damage of MOS Gate Oxide
Electron Beam Induced Damage of MOS Gate Oxide
Characteristics of Very High-Aspect-Ratio Contact Hole Etching
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0.2 μm Hole Pattern Generation by Critical Dimension Biassing Using Resin Overcoat
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