New Characterization of TiSi_2 Local Wiring Technology and Its Impact on Low Power/High Speed Quarter Micron CMOS
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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ONODA Hiroshi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Ida Jiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Onoda Hiroshi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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OZAWA Nobuo
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Ozawa Nobuo
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Ozawa Nobuo
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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OHTOMO Atsushi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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KAGEYAMA Makiko
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Ohtomo Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kageyama Makiko
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kageyama Makiko
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Onoda Hiroshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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