Ohmic Contact in Electron Cyclotron Resonance Chemical Vapor Deposition-TiN/Si Structure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-30
著者
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ONODA Hiroshi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Onoda Hiroshi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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HARADA Yusuke
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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AKAHORI Takashi
Advanced Technology Research Laboratories, Sumitomo Metal Industries, Ltd.
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Harada Yusuke
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Akahori Takashi
Advanced Technology Research Laboratories Sumitomo Metal Industries Ltd.
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Onoda Hiroshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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- Interfacial Reactions in Al-Alloy/Ti/Silicon-Dioxide-Based Substrate Structures for Multilayered Interconnects
- Ohmic Contact in Electron Cyclotron Resonance Chemical Vapor Deposition-TiN/Si Structure
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