Onoda Hiroshi | Vlsi R&d Center Oki Electric Industry Co. Ltd.

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著作論文

Mechanical Effects of Hafnium and Boron Addition to Aluminum Alloy Films for Submicrometer LSI Interconnects
New Characterization of TiSi_2 Local Wiring Technology and Its Impact on Low Power/High Speed Quarter Micron CMOS
Effects of Insulator Surface Roughness on Al-Alloy Film Crystallographic Orientation in Al-Alloy/Ti/Insulator Structure
Influence of Interface Structure between Overlayered Titanium Nitride Film and Aluminum on Multilayered Interconnects
Interfacial Reactions in Al-Alloy/Ti/Silicon-Dioxide-Based Substrate Structures for Multilayered Interconnects
Ohmic Contact in Electron Cyclotron Resonance Chemical Vapor Deposition-TiN/Si Structure
The Effect of Underlayer Texture on Cu Film Orientation in Cu/Refractory-Metal Structure
A Study of Via-Electromigration Failure in Multilevel Interconnection with High Temperature Sputtered Aluminum

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