OHTOMO Atsushi | VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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概要
- OHTOMO Atsushiの詳細を見る
- 同名の論文著者
- VLSI Research and Development Center, OKI Electric Industry Co., Ltd.の論文著者
関連著者
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Ida Jiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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OHTOMO Atsushi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Ohtomo Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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ONODA Hiroshi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Onoda Hiroshi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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OZAWA Nobuo
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Ozawa Nobuo
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Ozawa Nobuo
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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KAGEYAMA Makiko
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Ohtomo A
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Kageyama Makiko
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kageyama Makiko
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Kita Akio
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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Kita Akio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Nishi Kenji
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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YONEKAWA Kiyotaka
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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KAI Kazuhiko
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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AIKAWA Izumi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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YOSHIMARU Masashi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Kai Kazuhiko
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Aikawa Izumi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Yonekawa Kiyotaka
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Yoshimaru Masashi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Onoda Hiroshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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NISHI Kenji
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
著作論文
- New Characterization of TiSi_2 Local Wiring Technology and Its Impact on Low Power/High Speed Quarter Micron CMOS
- Dopant Redistribution Effect on Post-Junction Silicide Scheme Shallow Junction and a Proposal of Novel Self-Aligned Silicide Scheme
- Characterization of Dopant Interdiffusion and Power Reduction on TiSi_2 Local Wiring Technology in Sub-Half-Micron Complementary Metal Oxide Semiconductor
- Influence of Low Dielectric SiOF Film on Metal Oxide Semiconductor Field Effect Transistor Characteristics and Its Impact on Circuit Performance